作者
EG Fu, A Misra, H Wang, Lin Shao, X Zhang
发表日期
2010/12/31
期刊
Journal of Nuclear Materials
卷号
407
期号
3
页码范围
178-188
出版商
North-Holland
简介
Sputter-deposited Cu/V nanolayer films with individual layer thickness, h, varying from 1 to 200nm were subjected to helium (He) ion irradiation at room temperature. At a peak dose level of 6 displacements per atom (dpa), the average helium bubble density and lattice expansion decrease significantly with decreasing h. The magnitude of radiation hardening decreases with decreasing individual layer thickness, and becomes negligible when h is 2.5nm or less. This study indicates that nearly immiscible Cu/V interfaces spaced a few nm apart can effectively reduce the concentration of radiation induced point defects. Consequently, Cu/V nanolayers possess enhanced radiation tolerance, i.e., reduction of swelling and suppression of radiation hardening, compared to monolithic Cu or V.
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