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Epitaxial silver films with (111) and (110) orientations were deposited by magnetron sputtering onto silicon (111) and (110) substrates, respectively. High density growth twins with an average spacing of a few nanometers are observed in the (111) oriented films, with twin boundaries oriented normal to the growth direction. Twins are observed in the (110) oriented films with a much lower twin density, and the twin boundaries are oriented 60° from the growth direction. The epitaxial nanotwinned Ag (111) and (110) films have respective indentation hardness values of ∼2 and 1GPa. The influences of deposition parameters, stacking fault energy, and orientation of {111} planes on the formation of nanotwins are discussed.