发明者
Alan J Jacobsen
发表日期
2008/6/3
专利局
US
专利号
7382959
专利申请号
11580335
简介
A method and system of creating one or more Waveguides and/or patterning these Waveguides to form a 3D micro structure that uses mask and collimated light. In one embodi ment, the system includes at least one collimated light source selected to produce a collimated light beam; a reservoir having a photo-monomer adapted to polymerize by the collimated light beam; and a mask having at least one aperture and positioned betWeen the at least one collimated light source and the reservoir. Here, the at least one aperture is adapted to guide a portion of the collimated light beam into the photo-monomer to form the at least one polymer Waveguide through a portion of a volume of the photo monomer.
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