作者
SR Sriram, B Bindu
发表日期
2019/4/11
期刊
IEEE Transactions on Device and Materials Reliability
卷号
19
期号
2
页码范围
370-377
出版商
IEEE
简介
In this paper, a physics-based threshold voltage model of symmetrical double gate (DG) MOSFET, including the random dopants in the channel is presented. The model is derived from the solution of 2-D Poisson's equation and is suitable for circuit simulation. The average potential considering random dopants in the channel is used to calculate the threshold voltage and provides accurate results. The developed threshold voltage model is validated with TCAD simulations for different device dimensions and doping concentrations. The standard deviation (σV TH ) is calculated from a threshold voltage distribution of 200 devices. The proposed model is useful to simulate variations in a large number of devices with randomly placed dopants, with less computational time. The model is integrated in the Cadence circuit simulator and analyzed the effect of random dopant fluctuation-induced VTH variations of n-channel …
引用总数
2020202120222023111
学术搜索中的文章
SR Sriram, B Bindu - IEEE Transactions on Device and Materials Reliability, 2019