作者
Ralf K Heilmann, Paul T Konkola, Carl G Chen, GS Pati, Mark L Schattenburg
发表日期
2001/11/1
期刊
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
卷号
19
期号
6
页码范围
2342-2346
出版商
American Vacuum Society
简介
In traditional interference lithography, interference fringes are typically phase locked to a stationary substrate using analog homodyne photodiode signals that are fed back to control a phase-shifting device such as an electro-optic modulator or a piezoelectrically transduced mirror. Commercially available fringe-locking systems based on this approach often achieve stability of the interference fringes to within a small fraction of the fringe period p (typically peak-to-peak). We describe the performance of a heterodyne fringe control system utilizing acousto-optic phase shifters and digital controls that is designed to satisfy the much more stringent fringe control requirements for scanning beam interference lithography. We demonstrate locking to and expect further significant improvements. This versatile system can also be used to lock the phase of moving fringes in almost arbitrary fashion at fringe velocities up …
引用总数
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RK Heilmann, PT Konkola, CG Chen, GS Pati… - Journal of Vacuum Science & Technology B …, 2001