作者
AG Mukherjee, ME Kiziroglou, S Vatti, C Papavassiliou, AS Holmes, EM Yeatman
发表日期
2008
期刊
Proc. of MEMSWAVE
简介
Recently deep submicron and SiGe (silicongermanium) bipolar CMOS technologies have enhanced the performance of Si-based radio frequency (RF) integrated circuits up to microwave frequencies. The integration of RF MEMS components, such as inductors and capacitors, could further improve the performance of key RF circuit blocks such as voltage controlled oscillators (VCO), low-noise amplifiers, filters, mixers, and power amplifiers. We have developed a process to integrate RF MEMS inductors with standard commercial CMOS dies. The purpose of this work is to present the integration of MEMS inductors with VCOs fabricated in a 0.18 μm standard CMOS technology.
引用总数
学术搜索中的文章
AG Mukherjee, ME Kiziroglou, S Vatti, C Papavassiliou… - Proc. of MEMSWAVE, 2008