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In this work we apply low-loss electron energy loss spectroscopy (EELS) to probe the structural and electronic properties of single silicon nanocrystals (NCs) embedded in three different dielectric matrices (SiO2, SiC and Si3N4). A monochromated and aberration corrected transmission electron microscope has been operated at 80 kV to avoid sample damage and to reduce the impact of radiative losses. We present a novel approach to disentangle the electronic features corresponding to pure Si-NCs from the surrounding dielectric material contribution through an appropriate computational treatment of hyperspectral datasets. First, the different material phases have been identified by measuring the plasmon energy. Due to the overlapping of Si-NCs and dielectric matrix information, the variable shape and position of mixed plasmonic features increases the difficulty of non-linear fitting methods to identify and …