作者
Alexandre D Simard, Nezih Belhadj, Yves Painchaud, Sophie LaRochelle
发表日期
2012/4/10
期刊
IEEE Photonics Technology Letters
卷号
24
期号
12
页码范围
1033-1035
出版商
IEEE
简介
An accurate control of the apodization profile is still an issue for integrated Bragg grating filters fabricated in silicon-on-insulator because of the high modal confinement of these waveguides. In this letter, we present two fabrication-friendly apodization techniques that are compatible with deep UV lithography and can be used in mass-production of photonic-integrated circuits. These techniques are reliable even for weak effective index modulation amplitude, thus opening the door to the fabrication of long and elaborate grating structures.
学术搜索中的文章
AD Simard, N Belhadj, Y Painchaud, S LaRochelle - IEEE Photonics Technology Letters, 2012