作者
Shingo Yoneoka, Jaeho Lee, Matthieu Liger, Gary Yama, Takashi Kodama, Marika Gunji, J Provine, Roger T Howe, Kenneth E Goodson, Thomas W Kenny
发表日期
2012/2/8
期刊
Nano letters
卷号
12
期号
2
页码范围
683-686
出版商
American Chemical Society
简介
While the literature is rich with data for the electrical behavior of nanotransistors based on semiconductor nanowires and carbon nanotubes, few data are available for ultrascaled metal interconnects that will be demanded by these devices. Atomic layer deposition (ALD), which uses a sequence of self-limiting surface reactions to achieve high-quality nanolayers, provides an unique opportunity to study the limits of electrical and thermal conduction in metal interconnects. This work measures and interprets the electrical and thermal conductivities of free-standing platinum films of thickness 7.3, 9.8, and 12.1 nm in the temperature range from 50 to 320 K. Conductivity data for the 7.3 nm bridge are reduced by 77.8% (electrical) and 66.3% (thermal) compared to bulk values due to electron scattering at material and grain boundaries. The measurement results indicate that the contribution of phonon conduction is …
学术搜索中的文章
S Yoneoka, J Lee, M Liger, G Yama, T Kodama… - Nano letters, 2012