作者
Xu Wang, Wei Shi, Raha Vafaei, Nicolas AF Jaeger, Lukas Chrostowski
发表日期
2010/12/30
期刊
IEEE Photonics Technology Letters
卷号
23
期号
5
页码范围
290-292
出版商
IEEE
简介
We have demonstrated uniform and sampled Bragg gratings in silicon-on-insulator strip waveguides with symmetric sidewall corrugations. The fabrication is based on 193-nm deep ultraviolet lithography using a single mask. The measured reflection spectra of sampled gratings exhibit ten usable peaks spaced by 4.2 nm, and show good agreement with theoretical predictions.
引用总数
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学术搜索中的文章
X Wang, W Shi, R Vafaei, NAF Jaeger, L Chrostowski - IEEE Photonics Technology Letters, 2010