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A synthesis method has been developed for preparation of vanadium oxide thermometer thin film for microbolometer application. The structure presented is a 95-nm thin film prepared by sputter-depositing nine alternating multilayer thin films of vanadium pentoxide (V₂O₅) with thickness of 15 nm and vanadium with thickness of 5 nm followed by postdeposition annealing at 300°C in nitrogen (N₂) and oxygen (O₂) atmospheres. The resulting vanadium oxide (V _x O _y ) thermometer thin films exhibited temperature coefficient of resistance (TCR) of −3.55%/°C with room-temperature resistivity of 2.68 Ω cm for structures annealed in N₂ atmosphere, and TCR of −3.06%/°C with room-temperature resistivity of 0.84 Ω cm for structures annealed in O₂ atmosphere. Furthermore, optical measurements of N₂- and O₂-annealed samples were performed by Fourier-transform infrared …