查看文章

In the current study, ZnO/Si thin film was prepared through a plasmaenhanced chemical vapour deposition (PECVD) method and used for the elimination of azithromycin (AZM) from various real samples. Some specs about the structure and morphology of the ZnO/Si thin film were systematically examined utilising approaches such as X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS), and Scanning electron microscopy (SEM). The adsorption of AZM on the ZnO/Si thin film was accomplished under various statuses that are equilibrium time= 45 min, adsorbent dose= 0.025, pH solution= 7.0, and primary AZM concentration= 15 mg L− 1. Four models were utilised to monitoring the adsorption kinetic of AZM onto ZnO/Si thin film: pseudo-first order (PFO), pseudo-second order (PSO), Elovich (E) and intraparticle diffusion (ID) models. Equilibrium data were fitted to Langmuir (L), Freundlich (F), Temkin (T …