查看文章

In this paper, we report on an effective post-growth processing technique for developing semi-insulating (SI) photonic thin films absorbing in 1.3 µm. For that purpose, we examined a 1 µm thick unintentionally n-doped In 0.72 Ga 0.28 As 0.61 P 0.39 epilayer (0.95 eV bandgap) modified by multiple-energy MeV Fe ion implantation. Fe was chosen as a deep-level impurity. The ion beam processing was performed at room temperature, followed by rapid thermal annealing (RTA) at 800 C for 15 s. We investigated the impact of ion fluence on electrical properties by Hall effect measurements. Channelling Rutherford backscattering spectrometry, x-ray diffraction and photoluminescence measurements were carried out to evaluate crystal quality after each fabrication step. Beyond the onset of amorphization, when the total Fe fluence was more than 4.8× 10 13 cm− 2, the implanted InGaAsP layer showed evidence of a poor …