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We present self-assembly of InAs/InAlAs quantum dots by the droplet epitaxy technique on vicinal GaAs (111) A substrates. The small miscut angle, while maintaining the symmetries imposed on the quantum dot from the surface, allows a fast growth rate thanks to the presence of preferential nucleation sites at the step edges. A 100 nm InAlAs metamorphic layer with In content≥ 50% directly deposited on the GaAs substrate is already almost fully relaxed with a very flat surface. The quantum dots emit at the 1.3 μm telecom O-band with fine structure splitting as low as 16 μeV, thus making them suitable as photon sources in quantum communication networks using entangled photons.