作者
T Tsuruoka, K Terabe, T Hasegawa, M Aono
发表日期
2010/9/24
期刊
Nanotechnology
卷号
21
期号
42
页码范围
425205
出版商
IOP Publishing
简介
We report detailed current–voltage and current–time measurements to reveal the forming and switching behaviors of Cu/Ta 2 O 5/Pt nonvolatile resistive memory devices. The devices can be initially SET (from the OFF state to the ON state) when a low positive bias voltage is applied to the Cu electrode. This first SET operation corresponds to the first formation of a metal filament by inhomogeneous nucleation and subsequent growth of Cu on the Pt electrode, based on the migration of Cu ions in the stable Ta 2 O 5 matrix. After the forming, the device exhibits bipolar switching behavior (SET at positive bias and RESET (from the ON state to the OFF state) at negative bias) with increasing the ON resistance from a few hundred Ω to a few kΩ. From the measurements of the temperature stability of the ON states, we concluded that the RESET process consists of the Joule-heating-assisted oxidation of Cu atoms at the …
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