作者
Vaishnavi Krishnamurthi, Hareem Khan, Taimur Ahmed, Ali Zavabeti, Sherif Abdulkader Tawfik, Shubhendra Kumar Jain, Michelle JS Spencer, Sivacarendran Balendhran, Kenneth B Crozier, Ziyuan Li, Lan Fu, Md Mohiuddin, Mei Xian Low, Babar Shabbir, Andreas Boes, Arnan Mitchell, Christopher F McConville, Yongxiang Li, Kourosh Kalantar‐Zadeh, Nasir Mahmood, Sumeet Walia
发表日期
2020/11
期刊
Advanced Materials
卷号
32
期号
45
页码范围
2004247
简介
Atomically thin materials face an ongoing challenge of scalability, hampering practical deployment despite their fascinating properties. Tin monosulfide (SnS), a low‐cost, naturally abundant layered material with a tunable bandgap, displays properties of superior carrier mobility and large absorption coefficient at atomic thicknesses, making it attractive for electronics and optoelectronics. However, the lack of successful synthesis techniques to prepare large‐area and stoichiometric atomically thin SnS layers (mainly due to the strong interlayer interactions) has prevented exploration of these properties for versatile applications. Here, SnS layers are printed with thicknesses varying from a single unit cell (0.8 nm) to multiple stacked unit cells (≈1.8 nm) synthesized from metallic liquid tin, with lateral dimensions on the millimeter scale. It is reveal that these large‐area SnS layers exhibit a broadband spectral response …
引用总数
20202021202220232024328263219
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