| Plated Front Side Metallization on Transparent Conducting Oxide Utilizing Low-Cost APCVD SiO2 Insulating Layer SWG E. Issa, H. Nagel, L. Guzik, H. Javanbakht, E. Coron, E. Rädlein, M ... 36th European Photovoltaic Solar Energy Conference and Exhibition, Marseille …, 2019 | 4* | 2019 |
| Application of hydrosilane-free atmospheric pressure chemical vapor deposition of SiOx films in the manufacture of crystalline silicon solar cells E Issa, H Nagel, J Bartsch, M Glatthaar, E Rädlein Thin Solid Films 713, 138338, 2020 | 3 | 2020 |
| Novel Reactor Design and Method for Atmospheric Pressure Chemical Vapor Deposition of Micro and Nano SiO2-x Films in Photovoltaic Applications E Issa BoD–Books on Demand, 2022 | 1 | 2022 |
| Hydrosilane-Free Low-Cost APCVD of SiO2 Films for Crystalline Si Solar Cell Applications SWG H. Nagel, E. Issa, T. Nagel, M. Glatthaar 36th European Photovoltaic Solar Energy Conference and Exhibition, Marseille …, 2019 | 1* | 2019 |
| Method and reactor configuration for the production of oxide or oxynitride layers PDER Dr. Esmail Issa EP Patent EP4257724A1, 2023 | | 2023 |
| Face mask for protection against viral or bacterial infections PDER Dr. Esmail Issa, Dr. Uwe Krieger WO Patent WO2022189522A1, 2022 | | 2022 |
| Proposing hydrosilane-free cost-effective micro and nano SiO2 films by atmospheric pressure chemical vapor deposition for photovoltaic applications E Issa, H Nagel, E Rädlein | | 2021 |
| Verfahren und Vorrichtung zum Drucken einer Struktur aus Druckmedium auf eine Oberfläche eines Substrats L Guzik, E Issa, H Nagel DE Patent DE102018132276A1, 2020 | | 2020 |
Markus GlatthaarPV2+ GmbH在 pv2plus.com 的电子邮件经过验证
