| Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity J Lee, JM Lee, H Oh, C Kim, J Kim, DH Kim, B Shong, TJ Park, WH Kim Advanced Functional Materials 31 (33), 2102556, 2021 | 53 | 2021 |
| Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules JM Lee, J Lee, JW Han, H Park, SJ Kyung, IW Kim, JM Lee, TJ Park, ... Applied Surface Science 539, 148247, 2021 | 24 | 2021 |
| Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates JM Lee, J Lee, H Oh, J Kim, B Shong, TJ Park, WH Kim Applied Surface Science 589, 152939, 2022 | 19 | 2022 |
| Area-selective atomic layer deposition of Ru thin films using phosphonic acid self-assembled monolayers for metal/dielectric selectivity SH Lee, JM Lee, JH Lee, J Kwak, SW Chung, WH Kim Materials Letters 328, 133187, 2022 | 10 | 2022 |
| Area‐Selective Atomic Layer Deposition Using Vapor Dosing of Short‐Chain Alkanethiol Inhibitors on Metal/Dielectric Surfaces J Lee, JM Lee, JH Ahn, TJ Park, WH Kim Advanced Materials Interfaces 9 (13), 2102364, 2022 | 9 | 2022 |
| Metal-insulator transition and interfacial thermal transport in atomic layer deposited Ru nanofilms characterized by ultrafast terahertz spectroscopy HJ Shin, JM Lee, S Bae, WH Kim, S Sim Applied Surface Science 563, 150184, 2021 | 9 | 2021 |
| Area-selective atomic layer deposition of high-quality Ru thin films by chemo-selective adsorption of short alkylating agents JM Lee, SH Lee, J Oh, WH Kim Materials Letters 333, 133574, 2023 | 7 | 2023 |
| Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions NK Yu, JM Lee, WH Kim, B Shong Applied Surface Science 636, 157864, 2023 | 2 | 2023 |
| Enhanced Deposition Selectivity of High-k Dielectrics by Vapor Dosing and Selective Removal of Phosphonic Acid Inhibitors JM Lee, SH Lee, JH Lee, J Kwak, J Lee, WH Kim ACS Applied Materials & Interfaces 16 (28), 37157-37166, 2024 | | 2024 |
| Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition H Park, J Oh, JM Lee, WH Kim Materials Letters 366, 136570, 2024 | | 2024 |
| Highly area-selective atomic layer deposition of device-quality Hf1-xZrxO2 thin films through catalytic local activation HB Kim, JM Lee, D Sung, JH Ahn, WH Kim Chemical Engineering Journal 488, 150760, 2024 | | 2024 |
