关注
Huamao LIN
Huamao LIN
The University of Edinburgh
在 ime.a-star.edu.sg 的电子邮件经过验证
标题
引用次数
引用次数
年份
Flexible thin-film acoustic wave devices with off-axis bending characteristics for multisensing applications
Z Ji, J Zhou, H Lin, J Wu, D Zhang, S Garner, A Gu, S Dong, YQ Fu, ...
Microsystems & Nanoengineering 7 (1), 97, 2021
342021
Deep SiO2 etching with Al and AlN masks for MEMS devices
V Bliznetsov, HM Lin, YJ Zhang, D Johnson
Journal of Micromechanics and Microengineering 25 (8), 087002, 2015
312015
Investigation of flow distribution in microchannels heat sinks
D Bogojevic, K Sefiane, AJ Walton, JRE Christy, G Cummins, H Lin
Heat Transfer Engineering 30 (13), 1049-1057, 2009
262009
Direct Al–Al contact using low temperature wafer bonding for integrating MEMS and CMOS devices
H Lin, JTM Stevenson, AM Gundlach, CC Dunare, AJ Walton
Microelectronic engineering 85 (5-6), 1059-1061, 2008
222008
A low temperature drifting acoustic wave pressure sensor with an integrated vacuum cavity for absolute pressure sensing
T Wang, Z Tang, H Lin, K Zhan, J Wan, S Wu, Y Gu, W Luo, W Zhang
Sensors 20 (6), 1788, 2020
162020
Thin-film magnetic inductor for integrated power management
AA Muthukumaraswamy, KJ Chui, WY Lim, J Yu, S Soh, LY Wing, H Lin, ...
2017 IEEE 67th Electronic Components and Technology Conference (ECTC), 1485-1490, 2017
162017
An evaluation of test structures for measuring the contact resistance of 3-D bonded interconnects
H Lin, S Smith, JTM Stevenson, AM Gundlach, CC Dunare, AJ Walton
2008 IEEE International Conference on Microelectronic Test Structures, 123-127, 2008
142008
Test structures for the characterization of MEMS and CMOS integration technology
H Lin, AJ Walton, CC Dunare, JTM Stevenson, AM Gundlach, S Smith, ...
IEEE transactions on semiconductor manufacturing 21 (2), 140-147, 2008
112008
MEMS Industry-Worth Etching to Fabricate Tapered Structures in SiO2
V Bliznetsov, B Li, JW Lee, H Lin
Journal of Microelectromechanical Systems 26 (6), 1400-1407, 2017
92017
Oxide overlayer formation on sputtered ScAlN film exposed to air
M Li, H Lin, K Hu, Y Zhu
Applied Physics Letters 121 (11), 2022
82022
The electrical and optical properties of the nonlinear optical polymer DR1/PMMA films
H Zhang, Z Xia, S Zhou, H Ding, Y Cao, H Lin, J Zhu
9th International Symposium on Electrets (ISE 9) Proceedings, 462-467, 1996
81996
Structural characterization of the abnormal grains evolution in sputtered ScAlN films
M Li, K Hu, H Lin, Y Zhu
2021 IEEE International Ultrasonics Symposium (IUS), 1-3, 2021
72021
Integrated magnetic inductor technology on silicon
S Raju, S Soh, LY Wing, D Ho, L Huamao, M Stenger-Koob, J Wrona, ...
2018 IEEE 20th Electronics Packaging Technology Conference (EPTC), 262-265, 2018
72018
Bonding method using porosified surfaces for making stacked structures
RK Kotlanka, R Kumar, PC SANKARAPILLAI, LIN Huamao, P Yelehanka
US Patent 8,940,616, 2015
62015
Oxidation of sputtered AlScN films exposed to the atmosphere
M Li, K Hu, H Lin, V Felmetsger, Y Zhu
2022 IEEE International Ultrasonics Symposium (IUS), 1-3, 2022
52022
Texture evolution of ferroelectric AlScN films on metal under-layers
M Li, H Lin, P Luo, K Hu, C Liu, L Chen, Y Zhu
2022 IEEE International Symposium on Applications of Ferroelectrics (ISAF), 1-3, 2022
42022
Silicon-post processing CMOS wafers to create integrated sensors, MEMS and electro-optic systems
AJ Walton, JTM Stevenson, I Underwood, JG Terry, S Smith, W Parkes, ...
SAIEE Africa Research Journal 101 (1), 3-10, 2010
42010
Application of CMP for Integrating MEMS and CMOS Technology
H Lin, JTM Stevenson, AM Gundlach, CC Dunare, AJ Walton
16th MME-MicroMechanics Europe Workshop, 4, 2005
42005
The charge dynamics of thermally wet grown SiO/sub 2/electret by corona charging method with constant grid current
L Huamao, X Zhongfu, S Shaoqun, Z Hongyan, C Yang, Z Jianwei
9th International Symposium on Electrets (ISE 9) Proceedings, 133-138, 1996
41996
Ultrathin Pt and Mo films on Al1–xScxN: an interface investigation
Y Ding, X Hou, T Jin, Y Wang, X Lian, Y Liu, Y Wang, S Duan, X Geng, ...
Applied Surface Science 637, 157921, 2023
32023
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