| First transistor demonstration of thermal atomic layer etching: InGaAs FinFETs with sub-5 nm fin-width featuring in situ ALE-ALD W Lu, Y Lee, J Murdzek, J Gertsch, A Vardi, L Kong, SM George, ... 2018 IEEE International Electron Devices Meeting (IEDM), 39.1. 1-39.1. 4, 2018 | 39 | 2018 |
| In situ thermal atomic layer etching for sub-5 nm InGaAs multigate MOSFETs W Lu, Y Lee, JC Gertsch, JA Murdzek, AS Cavanagh, L Kong, ... Nano letters 19 (8), 5159-5166, 2019 | 38 | 2019 |
| Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide JA Murdzek, SM George Journal of Vacuum Science & Technology A 38 (2), 2020 | 36 | 2020 |
| Thermal atomic layer etching of amorphous and crystalline Al2O3 films JA Murdzek, A Rajashekhar, RS Makala, SM George Journal of Vacuum Science & Technology A 39 (4), 2021 | 24 | 2021 |
| Thermal atomic layer etching of germanium-rich SiGe using an oxidation and “conversion-etch” mechanism AI Abdulagatov, V Sharma, JA Murdzek, AS Cavanagh, SM George Journal of Vacuum Science & Technology A 39 (2), 2021 | 23 | 2021 |
| Atomic layer etching of ferroelectric hafnium zirconium oxide thin films enables giant tunneling electroresistance M Hoffmann, JA Murdzek, SM George, S Slesazeck, U Schroeder, ... Applied Physics Letters 120 (12), 2022 | 20 | 2022 |
| Thermal atomic layer etching of nickel using sequential chlorination and ligand-addition reactions JA Murdzek, A Lii-Rosales, SM George Chemistry of Materials 33 (23), 9174-9183, 2021 | 16 | 2021 |
| Thermal Atomic Layer Etching of CoO, ZnO, Fe2O3, and NiO by Chlorination and Ligand Addition Using SO2Cl2 and Tetramethylethylenediamine JL Partridge, JA Murdzek, VL Johnson, AS Cavanagh, A Fischer, T Lill, ... Chemistry of Materials 35 (5), 2058-2068, 2023 | 10 | 2023 |
| Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition JA Murdzek, A Lii-Rosales, SM George Journal of Vacuum Science & Technology A 41 (3), 2023 | 7 | 2023 |
| Thermal atomic layer etching of amorphous and crystalline hafnium oxide, zirconium oxide, and hafnium zirconium oxide JA Murdzek, SM George 2019 International Symposium on VLSI Technology, Systems and Application …, 2019 | 4 | 2019 |
| Thermal atomic layer etching of CoO using acetylacetone and ozone: Evidence for changes in oxidation state and crystal structure during sequential exposures JL Partridge, AI Abdulagatov, V Sharma, JA Murdzek, A Cavanagh, ... Applied Surface Science 638, 157923, 2023 | 3 | 2023 |
| Thermal Atomic Layer Etching of Gold Using Sulfuryl Chloride for Chlorination and Triethylphosphine for Ligand Addition JL Partridge, JA Murdzek, VL Johnson, AS Cavanagh, S Sharma, ... Chemistry of Materials, 2024 | 1 | 2024 |
| The Optimization of the Microwave Synthesis and Subsequent Characterization of Sodium Tungsten Bronze (NaxWO3) Materials J Murdzek | 1 | 2017 |
| (Invited) Ligand Addition for Thermal Atomic Layer Etching of Metals JA Murdzek, SM George Electrochemical Society Meeting Abstracts 242, 1117-1117, 2022 | | 2022 |
| Thermal Atomic Layer Etching of Crystalline Metal Oxides and Metals JA Murdzek University of Colorado at Boulder, 2022 | | 2022 |
| Sub-5-nm Fin-width InGaAs FinFETs by Thermal Atomic Layer Etching W Lu, Y Lee, J Murdzek, J Gertsch, A Vardi, L Kong, SM George, ... Electronic, Magnetic, Memory Devices, 111, 0 | | |
