A versatile method to prepare RAFT agent anchored substrates and the preparation of PMMA grafted nanoparticles C Li, J Han, CY Ryu, BC Benicewicz Macromolecules 39 (9), 3175-3183, 2006 | 395 | 2006 |
Synthesis, characterization, and AFM studies of dendronized polyferrocenylsilanes KT Kim, J Han, CY Ryu, FC Sun, SS Sheiko, MA Winnik, I Manners Macromolecules 39 (23), 7922-7930, 2006 | 25 | 2006 |
Reducing the coefficient of thermal expansion of polyimide films in microelectronics processing using ZnS particles at low concentrations H Jeon, C Yoon, YG Song, J Han, S Kwon, S Kim, I Chang, K Lee ACS Applied Nano Materials 1 (3), 1076-1082, 2018 | 21 | 2018 |
Discriminating among Co‐Monomer Sequence Distributions in Random Copolymers Using Interaction Chromatography J Han, BH Jeon, CY Ryu, JJ Semler, YK Jhon, J Genzer Macromolecular rapid communications 30 (18), 1543-1548, 2009 | 19 | 2009 |
Wafer supporting structure, intermediate structure of a semiconductor package including the wafer supporting structure HAN Jun-Won, J Kim, T Kim, HG Lee, Y Jeong, JS Choi US Patent 9,076,701, 2015 | 11 | 2015 |
Block copolymer analysis and purification CY Ryu, J Han, WS Lyoo Journal of Polymer Science Part B: Polymer Physics 48 (24), 2561-2565, 2010 | 11 | 2010 |
Synthesis of Cyclolinear Poly(carbosilane)-g-poly(methyl methacrylate or styrene) Random Copolymers J Hyun, J Han, CY Ryu, LV Interrante Macromolecules 39 (25), 8684-8691, 2006 | 11 | 2006 |
Temporary bonding adhesive compositions and methods of manufacturing a semiconductor device using the same T Kim, H Kato, J Kim, HAN Jun-Won, H Yasuda, S Tagami, M Sugo, ... US Patent 9,458,365, 2016 | 6 | 2016 |
Chemical composition effects on the fracture of polystyrene‐block‐poly (methyl methacrylate) block copolymers W Kim, J Han, CY Ryu, H Yang Journal of Polymer Science Part B: Polymer Physics 44 (24), 3612-3620, 2006 | 6 | 2006 |
Semiconductor device and method of manufacturing the same HAN Jun-Won, KIM Hye-Reun, H Han, D Lee, JS Choi US Patent App. 14/308,837, 2015 | 2 | 2015 |
Large feature wafer level in-line optical metrology techniques for advanced packaging schemes K Sieg, C Bottoms, C Waskiewicz, AM Mejia, J Han, S Butt, D Schmidt, ... Metrology, Inspection, and Process Control XXXVIII 12955, 129551P, 2024 | 1 | 2024 |
Spectral interferometry for TSV metrology in chiplet technology S Schoeche, D Schmidt, J Han, S Butt, K Sieg, M Cheng, A Cepler, S Dror, ... Metrology, Inspection, and Process Control XXXVIII 12955, 402-408, 2024 | 1 | 2024 |
Advanced novel optical stack technologies for high snr in cmos image sensor HY Park, Y Lee, J Park, H Song, T Lee, HK Gweon, Y Jung, J Bae, B Kim, ... 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2022 | 1 | 2022 |
Recent Progress in Separation of Macromolecules and Particulates American Chemical Society American Chemical Society, 2018 | 1 | 2018 |
Method of manufacturing a semiconductor device using purified block copolymers and semiconductor devices JW Han, K Su-Jin, KIM Hye-Ryun, J Kim, JS Choi US Patent 9,627,205, 2017 | 1 | 2017 |
Methods of Purifying a Block Copolymer and Methods of Forming a Pattern Using the Block Copolymer J Han, K Su-Jin, SW Kim, H Kim, C Jungsik US Patent App. 14/981,194, 2016 | 1 | 2016 |
Adsorption and Fractionation of RAFT-polymerized PS-b-PMMA Block Copolymers for 2D Liquid Chromatography J Han, CY Ryu, HC Kim, G Breyta, H Ito APS March Meeting Abstracts, N17. 003, 2007 | 1 | 2007 |
Controlling patterning uniformity in thick resist lithography CM Bottoms, A Hamer, A Mejia, A Hubbard, N Latham, K Sieg, J Fullam, ... Novel Patterning Technologies 2024, PC129560E, 2024 | | 2024 |
Organic photoelectric device, image sensor, and electronic device comprising the image sensor Y Obana, H Park, S Kwon, S Yi, J Han, H Morita, R Hamada, I Kouji US Patent App. 18/218,206, 2023 | | 2023 |
Organic compound, organic photoelectric device, image sensor, and electronic device HY Park, Y Obana, I Kouji, R Hamada, H Morita, JW Han US Patent App. 17/381,538, 2022 | | 2022 |