关注
Junwon Han
Junwon Han
IBM, Samsung electronics, Rensselaer Polytechnic Institute
在 ibm.com 的电子邮件经过验证
标题
引用次数
引用次数
年份
A versatile method to prepare RAFT agent anchored substrates and the preparation of PMMA grafted nanoparticles
C Li, J Han, CY Ryu, BC Benicewicz
Macromolecules 39 (9), 3175-3183, 2006
3952006
Synthesis, characterization, and AFM studies of dendronized polyferrocenylsilanes
KT Kim, J Han, CY Ryu, FC Sun, SS Sheiko, MA Winnik, I Manners
Macromolecules 39 (23), 7922-7930, 2006
252006
Reducing the coefficient of thermal expansion of polyimide films in microelectronics processing using ZnS particles at low concentrations
H Jeon, C Yoon, YG Song, J Han, S Kwon, S Kim, I Chang, K Lee
ACS Applied Nano Materials 1 (3), 1076-1082, 2018
212018
Discriminating among Co‐Monomer Sequence Distributions in Random Copolymers Using Interaction Chromatography
J Han, BH Jeon, CY Ryu, JJ Semler, YK Jhon, J Genzer
Macromolecular rapid communications 30 (18), 1543-1548, 2009
192009
Wafer supporting structure, intermediate structure of a semiconductor package including the wafer supporting structure
HAN Jun-Won, J Kim, T Kim, HG Lee, Y Jeong, JS Choi
US Patent 9,076,701, 2015
112015
Block copolymer analysis and purification
CY Ryu, J Han, WS Lyoo
Journal of Polymer Science Part B: Polymer Physics 48 (24), 2561-2565, 2010
112010
Synthesis of Cyclolinear Poly(carbosilane)-g-poly(methyl methacrylate or styrene) Random Copolymers
J Hyun, J Han, CY Ryu, LV Interrante
Macromolecules 39 (25), 8684-8691, 2006
112006
Temporary bonding adhesive compositions and methods of manufacturing a semiconductor device using the same
T Kim, H Kato, J Kim, HAN Jun-Won, H Yasuda, S Tagami, M Sugo, ...
US Patent 9,458,365, 2016
62016
Chemical composition effects on the fracture of polystyrene‐block‐poly (methyl methacrylate) block copolymers
W Kim, J Han, CY Ryu, H Yang
Journal of Polymer Science Part B: Polymer Physics 44 (24), 3612-3620, 2006
62006
Semiconductor device and method of manufacturing the same
HAN Jun-Won, KIM Hye-Reun, H Han, D Lee, JS Choi
US Patent App. 14/308,837, 2015
22015
Large feature wafer level in-line optical metrology techniques for advanced packaging schemes
K Sieg, C Bottoms, C Waskiewicz, AM Mejia, J Han, S Butt, D Schmidt, ...
Metrology, Inspection, and Process Control XXXVIII 12955, 129551P, 2024
12024
Spectral interferometry for TSV metrology in chiplet technology
S Schoeche, D Schmidt, J Han, S Butt, K Sieg, M Cheng, A Cepler, S Dror, ...
Metrology, Inspection, and Process Control XXXVIII 12955, 402-408, 2024
12024
Advanced novel optical stack technologies for high snr in cmos image sensor
HY Park, Y Lee, J Park, H Song, T Lee, HK Gweon, Y Jung, J Bae, B Kim, ...
2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2022
12022
Recent Progress in Separation of Macromolecules and Particulates
American Chemical Society
American Chemical Society, 2018
12018
Method of manufacturing a semiconductor device using purified block copolymers and semiconductor devices
JW Han, K Su-Jin, KIM Hye-Ryun, J Kim, JS Choi
US Patent 9,627,205, 2017
12017
Methods of Purifying a Block Copolymer and Methods of Forming a Pattern Using the Block Copolymer
J Han, K Su-Jin, SW Kim, H Kim, C Jungsik
US Patent App. 14/981,194, 2016
12016
Adsorption and Fractionation of RAFT-polymerized PS-b-PMMA Block Copolymers for 2D Liquid Chromatography
J Han, CY Ryu, HC Kim, G Breyta, H Ito
APS March Meeting Abstracts, N17. 003, 2007
12007
Controlling patterning uniformity in thick resist lithography
CM Bottoms, A Hamer, A Mejia, A Hubbard, N Latham, K Sieg, J Fullam, ...
Novel Patterning Technologies 2024, PC129560E, 2024
2024
Organic photoelectric device, image sensor, and electronic device comprising the image sensor
Y Obana, H Park, S Kwon, S Yi, J Han, H Morita, R Hamada, I Kouji
US Patent App. 18/218,206, 2023
2023
Organic compound, organic photoelectric device, image sensor, and electronic device
HY Park, Y Obana, I Kouji, R Hamada, H Morita, JW Han
US Patent App. 17/381,538, 2022
2022
系统目前无法执行此操作,请稍后再试。
文章 1–20