| Real-time monitoring of atomic layer etching in Cl2/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy Q Hao, P Kim, SK Nam, SY Kang, VM Donnelly Journal of Vacuum Science & Technology A 41 (3), 2023 | 5 | 2023 |
| Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy JR Vella, Q Hao, VM Donnelly, DB Graves Journal of Vacuum Science & Technology A 41 (6), 2023 | 3 | 2023 |
| Reactor wall effects in Si–Cl2–Ar atomic layer etching JR Vella, MAI Elgarhy, Q Hao, VM Donnelly, DB Graves Journal of Vacuum Science & Technology A 42 (4), 2024 | 1 | 2024 |
| A transient site balance model for atomic layer etching JR Vella, Q Hao, MAI Elgarhy, VM Donnelly, DB Graves Plasma Sources Science and Technology 33 (7), 075009, 2024 | | 2024 |
| Atomic layer etching in HBr/He/Ar/O2 plasmas Q Hao, MAI Elgarhy, P Kim, SK Nam, SY Kang, VM Donnelly Journal of Vacuum Science & Technology A 42 (4), 2024 | | 2024 |
| Atomic Layer Etching of Silicon in HBr-Containing Plasmas V Donnelly, Q Hao, P Kim, SY Kang, SK Nam APS Annual Gaseous Electronics Meeting Abstracts, FT1. 004, 2023 | | 2023 |
