| Transient laser heating induced hierarchical porous structures from block copolymer–directed self-assembly KW Tan, B Jung, JG Werner, ER Rhoades, MO Thompson, U Wiesner Science 349 (6243), 54-58, 2015 | 171 | 2015 |
| A light-emitting memristor AA Zakhidov, B Jung, JD Slinker, HD Abruña, GG Malliaras Organic Electronics 11 (1), 150-153, 2010 | 65 | 2010 |
| Kinetic rates of thermal transformations and diffusion in polymer systems measured during sub-millisecond laser-induced heating B Jung, J Sha, F Paredes, M Chandhok, TR Younkin, U Wiesner, CK Ober, ... ACS nano 6 (7), 5830-5836, 2012 | 42 | 2012 |
| Lateral temperature-gradient method for high-throughput characterization of material processing by millisecond laser annealing RT Bell, AG Jacobs, VC Sorg, B Jung, MO Hill, BE Treml, MO Thompson ACS Combinatorial Science 18 (9), 548-558, 2016 | 35 | 2016 |
| Laser-induced sub-millisecond heating reveals distinct tertiary ester cleavage reaction pathways in a photolithographic resist polymer B Jung, P Satish, DN Bunck, WR Dichtel, CK Ober, MO Thompson ACS nano 8 (6), 5746-5756, 2014 | 30 | 2014 |
| Experimental determination of thermal profiles during laser spike annealing with quantitative comparison to 3-dimensional simulations K Iyengar, B Jung, M Willemann, P Clancy, MO Thompson Applied Physics Letters 100 (21), 2012 | 28 | 2012 |
| Control of PS-b-PMMA directed self-assembly registration by laser induced millisecond thermal annealing AG Jacobs, B Jung, CK Ober, MO Thompson Alternative Lithographic Technologies VI 9049, 492-498, 2014 | 24 | 2014 |
| LWR reduction and flow of chemically amplified resist patterns during sub-millisecond heating B Jung, CK Ober, MO Thompson, M Chandhok Advances in Resist Materials and Processing Technology XXVIII 7972, 763-770, 2011 | 20 | 2011 |
| Synthesis and formation mechanism of all-organic block copolymer-directed templating of laser-induced crystalline silicon nanostructures KW Tan, JG Werner, MD Goodman, HS Kim, B Jung, H Sai, PV Braun, ... ACS Applied Materials & Interfaces 10 (49), 42777-42785, 2018 | 18 | 2018 |
| Stacked transistors with dielectric between source/drain materials of different strata W Rachmady, CY Huang, E Mannebach, A Phan, CSC Barrett, JP Gupta, ... US Patent App. 16/355,623, 2020 | 14 | 2020 |
| Control of polystyrene-block-poly(methyl methacrylate) directed self-assembly by laser-induced millisecond thermal annealing AG Jacobs, B Jung, J Jiang, CK Ober, MO Thompson Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (3), 031205-031205, 2015 | 14 | 2015 |
| Sub-millisecond post exposure bake of chemically amplified resists by CO2 laser heat treatment B Jung, J Sha, F Paredes, CK Ober, MO Thompson, M Chandhok, ... Advances in Resist Materials and Processing Technology XXVII 7639, 194-202, 2010 | 11 | 2010 |
| Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing J Sha, B Jung, MO Thompson, CK Ober, M Chandhok, TR Younkin Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 11 | 2009 |
| Controlled roughness reduction of patterned resist polymers using laser-induced sub-millisecond heating B Jung, CK Ober, MO Thompson Journal of Materials Chemistry C 2 (43), 9115-9121, 2014 | 9 | 2014 |
| Time dependent behavior of chemically amplified resist characterized under sub-millisecond post exposure bake B Jung, M Chandhok, TR Younkin, CK Ober, MO Thompson Journal of Photopolymer Science and Technology 24 (5), 487-490, 2011 | 9 | 2011 |
| Addressing challenges in lithography using sub-millisecond post exposure bake of chemically amplified resists B Jung, CK Ober, MO Thompson, TR Younkin, M Chandhok Advances in Resist Materials and Processing Technology XXVIII 7972, 382-387, 2011 | 7 | 2011 |
| Investigation of acid diffusion during laser spike annealing with systematically designed photoacid generators M Krysak, B Jung, MO Thompson, CK Ober Advances in Resist Materials and Processing Technology XXIX 8325, 196-201, 2012 | 6 | 2012 |
| Line edge roughness of high deprotection activation energy photoresist by using sub-millisecond post exposure bake J Jiang, B Jung, MO Thompson, CK Ober Advances in Resist Materials and Processing Technology XXX 8682, 443-449, 2013 | 5 | 2013 |
| Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications J Jiang, B Jung, MO Thompson, CK Ober Journal of Vacuum Science & Technology B 37 (4), 2019 | 4 | 2019 |
| Laser-induced millisecond heating of polymers and small molecules for pattern development B Jung Cornell University, 2014 | 3 | 2014 |
