| Synthesis and characterization of first row transition metal complexes containing α-imino alkoxides as precursors for deposition of metal films CH Winter, LC Kalutarage US Patent 9,758,866, 2017 | 329 | 2017 |
| Synthesis And Characterization Of First Row Transition Metal Complexes Containing a-Imino Alkoxides As Precursors For Deposition Of Metal Films CH Winter, LC Kalutarage US Patent App. 13/765,981, 2014 | 329* | 2014 |
| Methods Of Depositing Flowable Films Comprising SiO and SiN L Kalutarage, M Saly, D Thompson US Patent App. 15/297,262, 2017 | 310 | 2017 |
| Deposition Of Flowable Silicon-Containing Films LC Kalutarage, M Saly, D Thompson, AB Mallick, T Ashok, P Manna US Patent App. 15/654,185, 2018 | 304* | 2018 |
| Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films TJ Knisley, LC Kalutarage, CH Winter Coordination Chemistry Reviews 257 (23-24), 3222-3231, 2013 | 169 | 2013 |
| Low-Temperature Atomic Layer Deposition of Copper Films Using Borane Dimethylamine as the Reducing Co-reagent LC Kalutarage, SB Clendenning, CH Winter Chemistry of Materials 26 (12), 3731-3738, 2014 | 90 | 2014 |
| Volatile and Thermally Stable Mid to Late Transition Metal Complexes Containing α-Imino Alkoxide Ligands, a New Strongly Reducing Coreagent, and Thermal Atomic Layer Deposition … LC Kalutarage, PD Martin, MJ Heeg, CH Winter Journal of the American Chemical Society 135 (34), 12588-12591, 2013 | 77 | 2013 |
| Synthesis, Structure, and Solution Reduction Reactions of Volatile and Thermally Stable Mid to Late First Row Transition Metal Complexes Containing Hydrazonate Ligands LC Kalutarage, PD Martin, MJ Heeg, CH Winter Inorganic chemistry 52 (9), 5385-5394, 2013 | 21 | 2013 |
| Metallic materials deposition: metal‐organic precursors CH Winter, TJ Knisley, LC Kalutarage, MA Zavada, JP Klesko, ... Encyclopedia of Inorganic and Bioinorganic Chemistry, 2011 | 21 | 2011 |
| Low temperature molecular layer deposition of SiCON M Saly, D Thompson, L Kalutarage US Patent 9,812,318, 2017 | 19 | 2017 |
| Low Temperature Molecular Layer Deposition Of SiCON M Saly, D Thompson, L Kalutarage US Patent App. 14/801,215, 2016 | 19 | 2016 |
| Volatility and High Thermal Stability in Mid-to-Late First-Row Transition-Metal Complexes Containing 1, 2, 5-Triazapentadienyl Ligands LC Kalutarage, MJ Heeg, PD Martin, MJ Saly, DS Kuiper, CH Winter Inorganic chemistry 52 (3), 1182-1184, 2013 | 18 | 2013 |
| Manganese Precursor Selection and the Thermal Atomic Layer Deposition of Copper/Manganese Alloy Films LC Kalutarage, SB Clendenning, CH Winter ECS Transactions 64 (9), 147-157, 2014 | 15 | 2014 |
| Synthesis and characterization of first row transition metal complexes containing α-keto hydrazonate ligands as potential precursors for use in metal film deposition CH Winter, LC Kalutarage US Patent 8,907,115, 2014 | 3 | 2014 |
| Synthesis and Characterization of First Row Transition Metal Complexes Containing alpha-keto Hydrazonate Ligands as Potential Precursors for Use in Metal Film Deposition CH Winter, LC Kalutarage US Patent App. 13/709,564, 2014 | 3 | 2014 |
| Chemical Infiltration into Porous Dielectric Films L Kalutarage, M Saly, D Thompson US Patent App. 15/299,708, 2017 | 2 | 2017 |
| Methods and Apparatus for Depositing Yttrium-Containing Films LC Kalutarage, M Saly, T Knisley, B Schmiege, D Thompson US Patent App. 15/649,584, 2019 | | 2019 |
| Low Temperature Molecular Layer Deposition Of SiCON M Saly, D Thompson, LC Kalutarage US Patent App. 15/804,503, 2018 | | 2018 |
| Precursors for Atomic Layer Deposition CH Winter, LC Kalutarage US Patent App. 14/407,238, 2015 | | 2015 |
| Precursors And Processes For The Growth Of Metallic First Row Transition Metal Films By Atomic Layer Deposition LC Kalutarage | | 2014 |
