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Samar Saha
Samar Saha
Prospicient Devices
在 ieee.org 的电子邮件经过验证
标题
引用次数
引用次数
年份
Modeling process variability in scaled CMOS technology
SK Saha
IEEE Design & Test of Computers 27 (2), 8-16, 2010
1962010
Semiconductor structure having two levels of buried regions
DR Farrenkopf, RB Merrill, S Saha, KE Brehmer, K Gadepally, ...
US Patent 5,889,315, 1999
1881999
Fabrication of semiconductor structure having two levels of buried regions
DR Farrenkopf, RB Merrill, S Saha, KE Brehmer, K Gadepally, ...
US Patent 5,899,714, 1999
1661999
Systems and methods of non-volatile memory sensing including selective/differential threshold voltage features
H Van Tran, S Saha
US Patent 8,385,147, 2013
1142013
Compact MOSFET Modeling for Process Variability-Aware VLSI Circuit Design
SK Saha
IEEE Access 2, 104-115, 2014
1022014
MOSFET test structures for two-dimensional device simulation
S Saha
Solid-state electronics 38 (1), 69-73, 1995
821995
Subthreshold analog/RF performance enhancement of underlap DG FETs with high-k spacer for low power applications
K Koley, A Dutta, B Syamal, SK Saha, CK Sarkar
IEEE Transactions on Electron Devices 60 (1), 63-69, 2012
692012
Compact Models for Integrated Circuit Design: Conventional Transistors and Beyond
SK Saha
CRC Press, Taylor & Francis Group, 2015
582015
Design considerations for sub-90-nm split-gate flash-memory cells
SK Saha
IEEE Transactions on Electron Devices 54 (11), 3049-3055, 2007
542007
Technology computer aided design
C Sarkar
CRC Press, 2018
512018
Efficient III-Nitride MIS-HEMT devices with high-κ gate dielectric for high-power switching boost converter circuits
A Mohanbabu, N Mohankumar, DG Raj, P Sarkar, SK Saha
Superlattices and Microstructures 103, 270-284, 2017
462017
Analysis of High-Spacer Asymmetric Underlap DG-MOSFET for SOC Application
K Koley, A Dutta, SK Saha, CK Sarkar
IEEE Transactions on Electron Devices 62 (6), 1733-1738, 2015
452015
Design considerations for 25 nm MOSFET devices
S Saha
Solid-State Electronics 45 (10), 1851-1857, 2001
452001
Emerging business trends in the semiconductor industry
SK Saha
2013 Proceedings of PICMET'13: Technology Management in the IT-Driven …, 2013
422013
Scaling considerations for high performance 25 nm metal–oxide–semiconductor field effect transistors
S Saha
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2001
362001
Managing technology CAD for competitive advantage: An efficient approach for integrated circuit fabrication technology development
SK Saha
IEEE Transactions on Engineering Management 46 (2), 221-229, 1999
361999
Impact ionization rate of electrons for accurate simulation of substrate current in submicron devices
S Saha, CS Yeh, B Gadepally
Solid-state electronics 36 (10), 1429-1432, 1993
361993
Introduction to technology computer aided design
SK Saha
Technology Computer Aided Design, 17-60, 2018
312018
Effects of inversion layer quantization on channel profile engineering for nMOSFETs with 0.1 μm channel lengths
S Saha
Solid-State Electronics 42 (11), 1985-1991, 1998
301998
FinFET Devices for VLSI Circuits and Systems
SK Saha
CRC Press Taylor and Francis Group, 2020
282020
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