Fabrication of solid-state nanopores with single-nanometre precision AJ Storm, JH Chen, XS Ling, HW Zandbergen, C Dekker Nature materials 2 (8), 537-540, 2003 | 1633 | 2003 |
Fast DNA translocation through a solid-state nanopore AJ Storm, C Storm, J Chen, H Zandbergen, JF Joanny, C Dekker Nano letters 5 (7), 1193-1197, 2005 | 906 | 2005 |
Insulating behavior for DNA molecules between nanoelectrodes at the 100 nm length scale AJ Storm, J van Noort, S de Vries, C Dekker Applied Physics Letters 79 (23), 3881-3883, 2001 | 641 | 2001 |
Translocation of double-strand DNA through a silicon oxide nanopore AJ Storm, JH Chen, HW Zandbergen, C Dekker Physical Review E—Statistical, Nonlinear, and Soft Matter Physics 71 (5 …, 2005 | 581 | 2005 |
Electron-beam-induced deformations of SiO2 nanostructures AJ Storm, JH Chen, XS Ling, HW Zandbergen, C Dekker Journal of Applied Physics 98 (1), 2005 | 97 | 2005 |
Lithographically fabricated nanopore-based electrodes for electrochemistry SG Lemay, DM van den Broek, AJ Storm, D Krapf, RMM Smeets, ... Analytical chemistry 77 (6), 1911-1915, 2005 | 60 | 2005 |
Kinetics of Reduction of a RuO2(110) Film on Ru(0001) by H2 D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof The Journal of Physical Chemistry C 116 (51), 26822-26828, 2012 | 32 | 2012 |
Generation and decomposition of volatile tin hydrides monitored by in situ quartz crystal microbalances D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof Chemical Physics Letters 552, 122-125, 2012 | 28 | 2012 |
Decomposition of SnH4 molecules on metal and metal–oxide surfaces D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof Applied surface science 288, 673-676, 2014 | 24 | 2014 |
Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor DH Ehm, A Storm, JHJ Moors, BT Wolschrijn, T Stein, E te Sligte US Patent 8,419,862, 2013 | 22 | 2013 |
Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element DH Ehm, A Van De Runstraat, BT Wolschrijn, AJ Storm, T Stein, ... US Patent 7,959,310, 2011 | 19 | 2011 |
Particle cleaning of optical elements for microlithography DH Ehm, AJ Storm, JHJ Moors, A Czap, M Nagel, JCJ Van der Donck, ... US Patent 8,477,285, 2013 | 16 | 2013 |
Final Report on CCT-K1: Realizations of the ITS-90, 0.65 K to 24.5561 K, using rhodium–iron resistance thermometers R Rusby, D Head, C Meyer, W Tew, O Tamura, KD Hill, M de Groot, ... Metrologia 43 (1A), 03002-03002, 2006 | 14 | 2006 |
Quantification of the atomic hydrogen flux as a function of filament temperature and H2 flow rate D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof Journal of Vacuum Science & Technology A 30 (3), 2012 | 13 | 2012 |
Kinetics of reduction of a RuO2 (1 1 0) film on Ru (0 0 0 1) by atomic hydrogen D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof Microelectronic engineering 110, 60-65, 2013 | 12 | 2013 |
J. vanNoort, S. deVries, C AJ Storm Dekker, Appl. Phys. Lett 79, 3881-3883, 2001 | 12 | 2001 |
Strategy for minimizing EUV optics contamination during exposure N Harned, R Moors, M van Kampen, V Banine, J Huijbregtse, R Vanneer, ... EUV Symposium, Sept 29, 2008 | 11 | 2008 |
Single-molecule experiments on DNA with novel silicon nanostructures. AJ Storm | 11 | 2004 |
Compatibility assessment of novel reticle absorber materials for use in EUV lithography systems. J Stortelder, A Storm, V de Rooij-Lohmann, CC Wu, W van Schaik Extreme Ultraviolet (EUV) Lithography X 10957, 259-267, 2019 | 9 | 2019 |
Optical element and optical system for EUV lithography, and method for treating such an optical element HHPT Bekman, DH Ehm, J Huijbregtse, AJ Storm, T Graber, I Ament, ... US Patent 10,690,812, 2020 | 8 | 2020 |