| Indication of Electron Neutrino Appearance from an Accelerator-Produced Off-Axis<? format?> Muon Neutrino Beam K Abe, N Abgrall, Y Ajima, H Aihara, JB Albert, C Andreopoulos, ... Physical Review Letters 107 (4), 041801, 2011 | 2120 | 2011 |
| The T2K experiment K Abe, N Abgrall, H Aihara, Y Ajima, JB Albert, D Allan, PA Amaudruz, ... Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2011 | 1272 | 2011 |
| The T2K fine-grained detectors PA Amaudruz, M Barbi, D Bishop, N Braam, DG Brook-Roberge, S Giffin, ... Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2012 | 246 | 2012 |
| Raspberry-like metamolecules exhibiting strong magnetic resonances Z Qian, SP Hastings, C Li, B Edward, CK McGinn, N Engheta, Z Fakhraai, ... ACS nano 9 (2), 1263-1270, 2015 | 102 | 2015 |
| Controlling the topography and surface plasmon resonance of gold nanoshells by a templated surfactant-assisted seed growth method BL Sanchez-Gaytan, Z Qian, SP Hastings, ML Reca, Z Fakhraai, SJ Park The Journal of Physical Chemistry C 117 (17), 8916-8923, 2013 | 59 | 2013 |
| Quadrupole-enhanced Raman scattering SP Hastings, P Swanglap, Z Qian, Y Fang, SJ Park, S Link, N Engheta, ... ACS nano 8 (9), 9025-9034, 2014 | 58 | 2014 |
| Two-photon Lee-Goldburg nuclear magnetic resonance: Simultaneous homonuclear decoupling and signal acquisition CA Michal, SP Hastings, LH Lee The Journal of chemical physics 128 (5), 2008 | 10 | 2008 |
| Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method P Warnaar, SPS Hastings, ADAC ASSAFRAO, LJ Macht US Patent 10,466,594, 2019 | 7 | 2019 |
| Metrology method, apparatus and computer program S Tarabrin, SPS Hastings, AEA Koolen US Patent 10,598,483, 2020 | 6 | 2020 |
| Modal interference in spiky nanoshells SP Hastings, Z Qian, P Swanglap, Y Fang, N Engheta, SJ Park, S Link, ... Optics Express 23 (9), 11290-11311, 2015 | 6 | 2015 |
| Voltage contrast edge placement estimation for overlay, CD, and local uniformity metrology CE Tabery, V Rutigliani, S Hastings, E De Poortere, L Wang, P Leray, ... Proc. SPIE 10959, 109591U, 2019 | 5 | 2019 |
| Method to predict yield of a device manufacturing process Y Zhang, B Menchtchikov, CE Tabery, Y Zou, C Lin, Y Cheng, ... US Patent App. 17/293,373, 2022 | 4 | 2022 |
| Method of manufacturing devices A Slachter, WT Tel, DM Slotboom, VY Timoshkov, KWCA VAN DER, ... US Patent App. 17/296,316, 2021 | 4 | 2021 |
| Process context based wafer level grouping control: an advanced overlay process correction designed for DRAM 1z nm node in high volume manufacturing L Zhang, W Susanto, K Takahashi, A Chen, T Tang, Y Zou, C Lin, ... Metrology, Inspection, and Process Control for Microlithography XXXIV 11325 …, 2020 | 4 | 2020 |
| Method for controlling a manufacturing process and associated apparatuses NPM Brantjes, COX Matthijs, B Menchtchikov, CE Tabery, Y Zhang, Y Zou, ... US Patent 11,947,266, 2024 | 3 | 2024 |
| Voltage contrast edge placement estimation for Overlay, CD, and local uniformity metrology (Conference Presentation) CE Tabery, V Rutigliani, S Hastings, E de Poortere, L Wang, P Leray, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 2 | 2019 |
| Method to predict yield of a device manufacturing process A Ypma, CE Tabery, SHC Van Gorp, C Lin, D Sonntag, HE Cekli, ... US Patent 11,714,357, 2023 | 1 | 2023 |
| Methods using fingerprint and evolution analysis J Van Dongen, WT Tel, ROY Sarathi, Y Zhang, A Cavalli, BL Sjenitzer, ... US Patent 11,281,110, 2022 | 1 | 2022 |
| The Optical Properties of Spiky Gold Nanoshells S Hastings University of Pennsylvania, 2014 | 1 | 2014 |
| The T2K experiment P Kitching, K Kowalik, J Lagoda, P Mijakowski, P Przewlocki, E Rondio, ... Nuclear Instruments and Methods in Physics Research. Section A: Accelerators …, 2011 | 1 | 2011 |
