| Vertically stacked gate-all-around Si nanowire transistors: Key process optimizations and ring oscillator demonstration H Mertens, R Ritzenthaler, V Pena, G Santoro, K Kenis, A Schulze, ... 2017 IEEE international electron devices meeting (IEDM), 37.4. 1-37.4. 4, 2017 | 126 | 2017 |
| Novel forksheet device architecture as ultimate logic scaling device towards 2nm P Weckx, J Ryckaert, ED Litta, D Yakimets, P Matagne, P Schuddinck, ... 2019 IEEE International Electron Devices Meeting (IEDM), 36.5. 1-36.5. 4, 2019 | 100 | 2019 |
| First demonstration of vertically stacked gate-all-around highly strained germanium nanowire pFETs E Capogreco, L Witters, H Arimura, F Sebaai, C Porret, A Hikavyy, R Loo, ... IEEE Transactions on Electron Devices 65 (11), 5145-5150, 2018 | 69 | 2018 |
| First monolithic integration of 3d complementary fet (cfet) on 300mm wafers S Subramanian, M Hosseini, T Chiarella, S Sarkar, P Schuddinck, ... 2020 Ieee Symposium on Vlsi Technology, 1-2, 2020 | 66 | 2020 |
| Bilayer insulator tunnel barriers for graphene-based vertical hot-electron transistors S Vaziri, M Belete, ED Litta, AD Smith, G Lupina, MC Lemme, M Östling Nanoscale 7 (30), 13096-13104, 2015 | 61 | 2015 |
| Forksheet FETs for advanced CMOS scaling: forksheet-nanosheet co-integration and dual work function metal gates at 17nm NP space H Mertens, R Ritzenthaler, Y Oniki, B Briggs, BT Chan, A Hikavyy, T Hopf, ... 2021 Symposium on VLSI Technology, 1-2, 2021 | 53 | 2021 |
| Buried power rail integration with FinFETs for ultimate CMOS scaling A Gupta, OV Pedreira, G Arutchelvan, H Zahedmanesh, K Devriendt, ... IEEE Transactions on Electron Devices 67 (12), 5349-5354, 2020 | 32 | 2020 |
| Thulium silicate interfacial layer for scalable high-k/metal gate stacks ED Litta, PE Hellström, C Henkel, M Östling IEEE transactions on electron devices 60 (10), 3271-3276, 2013 | 32 | 2013 |
| Integration of TmSiO/HfO2 Dielectric Stack in Sub-nm EOT High-k/Metal Gate CMOS Technology ED Litta, PE Hellström, M Östling IEEE Transactions on Electron Devices 62 (3), 934-939, 2015 | 24 | 2015 |
| High-deposition-rate atomic layer deposition of thulium oxide from TmCp3 and H2O ED Litta, PE Hellström, C Henkel, S Valerio, A Hallén, M Östling Journal of the Electrochemical Society 160 (11), D538, 2013 | 24 | 2013 |
| Nanosheet FETs and their potential for enabling continued Moore's law scaling A Veloso, G Eneman, A De Keersgieter, D Jang, H Mertens, P Matagne, ... 2021 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM), 1-3, 2021 | 20 | 2021 |
| Comparison of electrical performance of co-integrated forksheets and nanosheets transistors for the 2nm technological node and beyond R Ritzenthaler, H Mertens, G Eneman, E Simoen, E Bury, P Eyben, ... 2021 IEEE International Electron Devices Meeting (IEDM), 26.2. 1-26.2. 4, 2021 | 19 | 2021 |
| Enabling logic with backside connectivity via n-TSVs and its potential as a scaling booster A Veloso, A Jourdain, G Hiblot, F Schleicher, K D’have, F Sebaai, ... 2021 Symposium on VLSI Technology, 1-2, 2021 | 18 | 2021 |
| Buried power rail integration with Si FinFETs for CMOS scaling beyond the 5 nm node A Gupta, H Mertens, Z Tao, S Demuynck, J Bömmels, G Arutchelvan, ... 2020 IEEE Symposium on VLSI Technology, 1-2, 2020 | 16 | 2020 |
| Buried power SRAM DTCO and system-level benchmarking in N3 S Salahuddin, M Perumkunnil, ED Litta, A Gupta, P Weckx, J Ryckaert, ... 2020 IEEE Symposium on VLSI Technology, 1-2, 2020 | 15 | 2020 |
| Scaled FinFETs connected by using both wafer sides for routing via buried power rails A Veloso, A Jourdain, D Radisic, R Chen, G Arutchelvan, B O’Sullivan, ... IEEE Transactions on Electron Devices 69 (12), 7173-7179, 2022 | 14 | 2022 |
| Interface engineering of Ge using thulium oxide: Band line-up study IZ Mitrovic, M Althobaiti, AD Weerakkody, N Sedghi, S Hall, VR Dhanak, ... Microelectronic engineering 109, 204-207, 2013 | 13 | 2013 |
| Forksheet FETs with bottom dielectric isolation, self-aligned gate cut, and isolation between adjacent source-drain structures H Mertens, R Ritzenthaler, Y Oniki, PP Gowda, G Mannaert, F Sebaai, ... 2022 International Electron Devices Meeting (IEDM), 23.1. 1-23.1. 4, 2022 | 12 | 2022 |
| Process variation analysis of device performance using virtual fabrication: methodology demonstrated on a CMOS 14-nm FinFET vehicle B Vincent, R Hathwar, M Kamon, J Ervin, T Schram, T Chiarella, ... IEEE Transactions on Electron Devices 67 (12), 5374-5380, 2020 | 12 | 2020 |
| Electrical characterization of thulium silicate interfacial layers for integration in high-k/metal gate CMOS technology ED Litta, PE Hellström, C Henkel, M Östling Solid-state electronics 98, 20-25, 2014 | 12 | 2014 |
