| Resolution, line-edge roughness, sensitivity tradeoff, and quantum yield of high photo acid generator resists for extreme ultraviolet lithography CD Higgins, CR Szmanda, A Antohe, G Denbeaux, J Georger, ... Japanese Journal of Applied Physics 50 (3R), 036504, 2011 | 55 | 2011 |
| Quantitative measurement of EUV resist outgassing G Denbeaux, R Garg, J Waterman, C Mbanaso, J Netten, R Brainard, ... 23rd European Mask and Lithography Conference, 1-5, 2007 | 32 | 2007 |
| Film quantum yields of EUV and ultra-high PAG photoresists E Hassanein, C Higgins, P Naulleau, R Matyi, G Gallatin, G Denbeaux, ... Emerging Lithographic Technologies XII 6921, 453-465, 2008 | 30 | 2008 |
| RLS tradeoff vs. quantum yield of high PAG EUV resists C Higgins, A Antohe, G Denbeaux, S Kruger, J Georger, R Brainard Alternative Lithographic Technologies 7271, 1118-1129, 2009 | 27 | 2009 |
| A low-loss SiN photonic integrated circuit foundry platform for waveguide-enhanced Raman spectroscopy NF Tyndall, TH Stievater, DA Kozak, MW Pruessner, WS Rabinovich, ... Smart Photonic and Optoelectronic Integrated Circuits XXIII 11690, 40-46, 2021 | 24 | 2021 |
| Study of alternative capping and absorber layers for extreme ultraviolet (EUV) masks for sub-16nm half-pitch nodes A Rastegar, M House, R Tian, T Laursen, A Antohe, P Kearney Extreme Ultraviolet (EUV) Lithography V 9048, 124-134, 2014 | 22 | 2014 |
| Carbon contamination topography analysis of EUV masks YJ Fan, L Yankulin, P Thomas, C Mbanaso, A Antohe, R Garg, Y Wang, ... Extreme Ultraviolet (EUV) Lithography 7636, 149-156, 2010 | 19 | 2010 |
| SEMATECH produces defect-free EUV mask blanks: defect yield and immediate challenges AO Antohe, D Balachandran, L He, P Kearney, A Karumuri, F Goodwin, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 415-419, 2015 | 15 | 2015 |
| Inspection and compositional analysis of sub-20 nm EUV mask blank defects by thin film decoration technique V Jindal, A John, J Harris-Jones, P Kearney, A Antohe, E Stinzianni, ... Extreme Ultraviolet (EUV) Lithography IV 8679, 478-487, 2013 | 13 | 2013 |
| Effect of carbon contamination on the printing performance of extreme ultraviolet masks YJ Fan, L Yankulin, A Antohe, P Thomas, C Mbanaso, R Garg, Y Wang, ... Journal of Vacuum Science & Technology B 28 (2), 321-328, 2010 | 11 | 2010 |
| Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation C Mbanaso, S Kruger, C Higgins, Y Khopkar, A Antohe, B Cardineau, ... Extreme Ultraviolet (EUV) Lithography II 7969, 807-815, 2011 | 10 | 2011 |
| Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging YJ Fan, L Yankulin, A Antohe, R Garg, P Thomas, C Mbanaso, A Wüest, ... Alternative Lithographic Technologies 7271, 1021-1029, 2009 | 10 | 2009 |
| EUV resist outgassing: scaling to HVM intensity AO Antohe, C Mbanaso, YJ Fan, L Yankulin, R Garg, P Thomas, ... Alternative Lithographic Technologies 7271, 612-618, 2009 | 10 | 2009 |
| Extreme ultraviolet resist outgassing and its effect on nearby optics G Denbeaux, R Garg, C Mbanaso, J Waterman, L Yankulin, A Antohe, ... Emerging Lithographic Technologies XII 6921, 439-445, 2008 | 10 | 2008 |
| Production of EUV mask blanks with low killer defects AO Antohe, P Kearney, M Godwin, L He, AJ Kadaksham, F Goodwin, ... Extreme Ultraviolet (EUV) Lithography V 9048, 102-109, 2014 | 9 | 2014 |
| EUV research activity at SEMATECH M Neisser, SH Jen, JS Chun, A Antohe, L He, P Kearney, F Goodwin Journal of Photopolymer science and technology 27 (5), 595-600, 2014 | 6 | 2014 |
| Challenges in EUV mask blank deposition for high volume manufacturing V Jindal, P Kearney, A Antohe, M Godwin, A John, R Teki, J Harris-Jones, ... Extreme Ultraviolet (EUV) Lithography IV 8679, 365-372, 2013 | 6 | 2013 |
| Ion beam deposition system for depositing low defect density extreme ultraviolet mask blanks V Jindal, P Kearney, J Sohn, J Harris-Jones, A John, M Godwin, A Antohe, ... Extreme Ultraviolet (EUV) Lithography III 8322, 588-595, 2012 | 6 | 2012 |
| A visible-light foundry platform from AIM photonics NF Tyndall, MW Pruessner, NM Fahrenkopf, A Antohe, TH Stievater 2023 Optical Fiber Communications Conference and Exhibition (OFC), 1-2, 2023 | 5 | 2023 |
| Out-of-band radiation mitigation at 10.6 μm by molecular absorbers in laser-produced plasma extreme ultraviolet sources C Mbanaso, A Antohe, H Bull, F Goodwin, A Hershcovitch, G Denbeaux Journal of Micro/Nanolithography, MEMS, and MOEMS 11 (2), 021116-021116, 2012 | 5 | 2012 |
