| An atomic scale model of multilayer surface reactions and the feature profile evolution during plasma etching Y Osano, K Ono Japanese journal of applied physics 44 (12R), 8650, 2005 | 60 | 2005 |
| Atomic-scale cellular model and profile simulation of poly-Si gate etching in high-density chlorine-based plasmas: Effects of passivation layer formation on evolution of … Y Osano, K Ono Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 50 | 2008 |
| A model analysis of feature profile evolution and microscopic uniformity during polysilicon gate etching in Cl2/O2 plasmas Y Osano, M Mori, N Itabashi, K Takahashi, K Eriguchi, K Ono Japanese journal of applied physics 45 (10S), 8157, 2006 | 31 | 2006 |
| Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas M Mori, S Irie, Y Osano, K Eriguchi, K Ono Journal of Vacuum Science & Technology A 39 (4), 2021 | 9 | 2021 |
| Formation mechanisms of etched feature profiles during Si etching in Cl2/O2 plasmas M Mori, Y Osano, S Irie, K Eriguchi, K Ono Journal of Vacuum Science & Technology A 37 (5), 2019 | 7 | 2019 |
| An atomic scale model of plasma-surface interactions and numerical analysis of the feature profile evolution during silicon etching in chlorine-containing plasmas Y Osano 京都大学 (Kyoto University), 2006 | 1 | 2006 |
| Atomic-scale model analysis of the feature profile evolution during Si etching in chlorine-and bromine-containing plasmas S Irie, Y Osano, M Mori, K Eriguchi, K Ono APS Annual Gaseous Electronics Meeting Abstracts, DT1. 004, 2007 | | 2007 |
| Profile Simulation Model Including Ion Reflection on Feature Surfaces during Plasma Etching S Irie, Y Osano, M Mori, K Eriguchi, K Ono PROCEEDINGS OF INTERNATIONAL SYMPOSIUM ON DRY PROCESS 6, 35, 2006 | | 2006 |
| Nuclear Science, Plasmas, and Electric Discharges-An Atomic Scale Model of Multilayer Surface Reactions and the Feature Profile Evolution during Plasma Etching Y Osano, K Ono Japanese Journal of Applied Physics-Part 1 Regular Papers and Short Notes 44 …, 2005 | | 2005 |
| Vacuum HAFI Y Osano, K Ono 17th International Symposium on Plasma Chemistry: Abstracts and Full-papers …, 2005 | | 2005 |
| Feature Profile Modeling of Silicon Etching in Chlorine-Containing Plasmas Y Osano, A Sano, K Ono, T Kazuo, Y Setsuhara APS Annual Gaseous Electronics Meeting Abstracts, SRP. 057, 2003 | | 2003 |
| Model analysis of ion reflection on feature surfaces and profile evolution during Si etching in chlorine-and bromine-containing plasmas S Irie, Y Osano, M Mori, K Eriguchi, K Ono | | |
| Numerical studies of 1-dimensional discrete Ginzburg-Landau equation Y OSANO | | |
| A Numerical Analysis of rf Discharges and Particle Transport in the Sheath and Microstructures on the Substrate Y Osano, T Nomura, K Miki, K Ono | | |
