| Machine learning (ML)-guided OPC using basis functions of polar Fourier transform S Choi, S Shim, Y Shin Optical Microlithography XXIX 9780, 63-70, 2016 | 35 | 2016 |
| The new test pattern selection method for OPC model calibration, based on the process of clustering in a hybrid space D Vengertsev, K Kim, SH Yang, S Shim, S Moon, A Shamsuarov, S Lee, ... Photomask Technology 2012 8522, 387-394, 2012 | 30 | 2012 |
| Machine learning-based 3d resist model S Shim, S Choi, Y Shin Optical Microlithography XXX 10147, 408-417, 2017 | 27 | 2017 |
| Synthesis of lithography test patterns through topology-oriented pattern extraction and classification S Shim, W Chung, Y Shin Design-Process-Technology Co-optimization for Manufacturability VIII 9053, 34-43, 2014 | 27 | 2014 |
| Topology-oriented pattern extraction and classification for synthesizing lithography test patterns S Shim, Y Shin Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (1), 013503-013503, 2015 | 24 | 2015 |
| Etch proximity correction through machine-learning-driven etch bias model S Shim, Y Shin Advanced Etch Technology for Nanopatterning V 9782, 58-67, 2016 | 23 | 2016 |
| Defect probability of directed self-assembly lithography: fast identification and post-placement optimization S Shim, W Chung, Y Shin 2015 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 404-409, 2015 | 23 | 2015 |
| Machine learning (ML)-based lithography optimizations S Shim, S Choi, Y Shin 2016 IEEE Asia Pacific Conference on Circuits and Systems (APCCAS), 530-533, 2016 | 19 | 2016 |
| Neural network classifier-based OPC with imbalanced training data S Choi, S Shim, Y Shin IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2018 | 17 | 2018 |
| Redundant via insertion for multiple-patterning directed-self-assembly lithography S Shim, W Chung, Y Shin Proceedings of the 53rd Annual Design Automation Conference, 1-6, 2016 | 16 | 2016 |
| Machine learning-guided etch proximity correction S Shim, Y Shin IEEE Transactions on Semiconductor Manufacturing 30 (1), 1-7, 2016 | 15 | 2016 |
| Investigation of SOL parameters and divertor particle flux from electric probe measurements in KSTAR JG Bak, HS Kim, MK Bae, JW Juhn, DC Seo, EN Bang, SB Shim, ... Journal of Nuclear Materials 463, 424-427, 2015 | 14 | 2015 |
| Method of manufacturing semiconductor device by using uniform optical proximity correction SW Kim, CS Suh, SW Choi, J Ser, M Jeong, SB Shim US Patent 8,392,854, 2013 | 14 | 2013 |
| The effective etch process proximity correction methodology for improving on chip CD variation in 20 nm node DRAM gate JG Park, S Kim, SB Shim, SS Suh, HK Oh Design for Manufacturability through Design-Process Integration V 7974, 275-284, 2011 | 14 | 2011 |
| Verification of directed self-assembly (DSA) guide patterns through machine learning S Shim, S Cai, J Yang, S Yang, B Choi, Y Shin Alternative Lithographic Technologies VII 9423, 318-325, 2015 | 9 | 2015 |
| Mask optimization for directed self-assembly lithography: inverse DSA and inverse lithography S Shim, Y Shin 2016 21st Asia and South Pacific Design Automation Conference (ASP-DAC), 83-88, 2016 | 8 | 2016 |
| Physical simulation for verification and OPC on full chip level S Shim, S Moon, Y Kim, S Choi, Y Kim, B Küchler, U Klostermann, M Do, ... Optical Microlithography XXIV 7973, 847-855, 2011 | 8 | 2011 |
| Printed circuit board and method for manufacturing same SW Ryu, SB Shim, SY Shin US Patent 9,706,652, 2017 | 6 | 2017 |
| Optical design for the optimum solid immersion lens with high numerical aperture and large tolerance N Choi, S Shim, TD Milster, J Kim Japanese journal of applied physics 46 (6S), 3724, 2007 | 6 | 2007 |
| Fast verification of guide-patterns for directed self-assembly lithography S Shim, Y Shin IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2016 | 5 | 2016 |
