| Influence of sputtering power on structure and photocatalyst properties of DC magnetron sputtered TiO2 thin film P Pansila, N Witit-Anun, S Chaiyakun Procedia Engineering 32, 862-867, 2012 | 48 | 2012 |
| Infrared study on room-temperature atomic layer deposition of TiO2 using tetrakis (dimethylamino) titanium and remote-plasma-excited water vapor K Kanomata, P Pansila, B Ahmmad, S Kubota, K Hirahara, F Hirose Applied Surface Science 308, 328-332, 2014 | 47 | 2014 |
| Room-temperature atomic layer deposition of ZrO2 using tetrakis (ethylmethylamino) zirconium and plasma-excited humidified argon K Kanomata, K Tokoro, T Imai, P Pansila, M Miura, B Ahmmad, S Kubota, ... Applied Surface Science 387, 497-502, 2016 | 34 | 2016 |
| Effect of poly (vinyl alcohol)/chitosan ratio on electrospun-nanofiber morphologies T Jamnongkan, A Wattanakornsiri, PP Pansila, C Migliaresi, S Kaewpirom Advanced Materials Research 463, 734-738, 2012 | 32 | 2012 |
| Kinetics and mechanism of adsorptive removal of copper from aqueous solution with poly (vinyl alcohol) hydrogel T Jamnongkan, K Kantarot, K Niemtang, PP Pansila, A Wattanakornsiri Transactions of Nonferrous Metals Society of China 24 (10), 3386-3393, 2014 | 31 | 2014 |
| Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3 P Pansila, K Kanomata, M Miura, B Ahmmad, S Kubota, F Hirose Applied Surface Science 357, 1920-1927, 2015 | 18 | 2015 |
| Room temperature atomic layer deposition of gallium oxide investigated by IR absorption spectroscopy PP Pansila, K Kanomata, B Ahmmad, S Kubota, F Hirose IEICE Transactions on Electronics 98 (5), 382-389, 2015 | 13 | 2015 |
| Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis (ethylmethylamino) hafnium and remote plasma-excited oxidizing agents K Kanomata, H Ohba, P Pungboon Pansila, B Ahmmad, S Kubota, ... Journal of Vacuum Science & Technology A 33 (1), 2015 | 13 | 2015 |
| Kinetic study on initial surface reaction of titanium dioxide growth using tetrakis (dimethylamino) titanium and water in atomic layer deposition process: Density functional … T Promjun, T Rattana, PP Pansila Chemical Physics 562, 111653, 2022 | 9 | 2022 |
| Room-Temperature Atomic Layer Deposition of Al2O3 with Remote-Plasma Source Investigated by IR Absorption Spectroscopy K Kanomata, PP Pansila, H Ohba, BA Arima, S Kubota, K Hirahara, ... IEICE Trans. Electron 98, 1-7, 2015 | 9 | 2015 |
| Nitrogen adsorption of Si (100) surface by plasma excited ammonia PP Pansila, K Kanomata, B Ahmmad, S Kubota, F Hirose IEICE Transactions on Electronics 98 (5), 395-401, 2015 | 7 | 2015 |
| Preparation of Pure Anatase TiO2 Thin Films by DC Sputtering Technique: Study on the Effect of Oxygen Partial Pressure PP Pansila, N Witit-Anun, T Jamnongkan, S Chaiyakun Advanced Materials Research 463, 1415-1419, 2012 | 7 | 2012 |
| Effect of oxygen partial pressure on the morphological properties and the photocatalytic activities of titania thin films on unheated substrates by sputtering deposition method PP Pansila, N Witit-Anun, S Chaiyakun Advanced Materials Research 770, 18-21, 2013 | 6 | 2013 |
| Computational prediction of trimethylgallium adsorption on Si (100)(2× 1) in atomic layer deposition S Sukhasena, PP Pansila Key Engineering Materials 759, 43-47, 2018 | 5 | 2018 |
| Kinetic Study of Tetrakis (Dimethylamido) Titanium and Titanium Tetrachloride Adsorption on a Silicon Surface in Atomic Layer Deposition: A DFT Calculation T Promjun, T Rattana, P Pungboon Pansila Integrated Ferroelectrics 225 (1), 93-103, 2022 | 3 | 2022 |
| Energy audit and evaluation of specific energy consumption of lighting systems in a new building: a Kasetsart university case study W Sriboon, P Pansila, S Khunthong, S Sukprasong Appl. Eng. Lett 6 (4), 157-165, 2020 | 3 | 2020 |
| Comparison of H2O2 and H2O oxidations on TDMAT absorbed on silicon (100) surface during reaction step of ALD–TiO2 process: A DFT study T Promjun, M Phothisonothai, W Sriboon, S Sukprasong, PP Pansila Materials Today Communications 38, 108125, 2024 | 2 | 2024 |
| RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor K Kanomata, PP Pansila, H Ohba, B Ahmmad, S Kubota, K Hirahara, ... Electrochemical Society Meeting Abstracts 227, 2274-2274, 2015 | 1 | 2015 |
| The Characteristic of TMG adsorption on the Si (100)(2× 1) surface in atomic layer deposition (ALD): Computational prediction of Si9H12O2GaCH3 structure PP Pansila, S Sukhasena, P Chunpang NU. International Journal of Science 16 (2), 1-10, 2019 | | 2019 |
| Computational Study of the Adsorption Step of Aluminum Chloride Gas in the Atomic Layer Deposition Process of Aluminum Oxide Thin Film P Nantajul, J Chompookeaw, T Promjun, P Chunpang, Y Uraichuen, ... Burapha Science Journal, 1802-1810, 2018 | | 2018 |
Bashir AhmmadYamagata University在 yz.yamagata-u.ac.jp 的电子邮件经过验证
