| Plasma atomic layer deposition HCM Knoops, K De Peuter, WMM Kessels US Patent 9,637,823, 2017 | 393 | 2017 |
| In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition E Langereis, SBS Heil, HCM Knoops, W Keuning, MCM Van de Sanden, ... Journal of Physics D: Applied Physics 42 (7), 073001, 2009 | 389 | 2009 |
| Conformality of plasma-assisted ALD: physical processes and modeling HCM Knoops, E Langereis, MCM Van De Sanden, WMM Kessels Journal of The Electrochemical Society 157 (12), G241, 2010 | 209 | 2010 |
| Status and prospects of plasma-assisted atomic layer deposition H Knoops, T Faraz, K Arts, WMM Kessels Journal of Vacuum Science & Technology A 37 (3), 2019 | 183 | 2019 |
| Atomic layer etching: What can we learn from atomic layer deposition? T Faraz, F Roozeboom, HCM Knoops, WMM Kessels ECS Journal of Solid State Science and Technology 4 (6), N5023, 2015 | 162 | 2015 |
| Remote plasma ALD of platinum and platinum oxide films HCM Knoops, AJM Mackus, ME Donders, MCM Van De Sanden, ... Electrochemical and Solid-State Letters 12 (7), G34, 2009 | 160 | 2009 |
| Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy WMM Kessels, HCM Knoops, SAF Dielissen, AJM Mackus, ... Applied Physics Letters 95 (1), 2009 | 154 | 2009 |
| Atomic layer deposition for nanostructured Li-ion batteries HCM Knoops, ME Donders, MCM Van de Sanden, PHL Notten, ... Journal of Vacuum Science & Technology A 30 (1), 2012 | 150 | 2012 |
| Atomic layer deposition HCM Knoops, SE Potts, AA Bol, WMM Kessels Handbook of Crystal Growth, 1101-1134, 2015 | 130 | 2015 |
| Atomic layer deposition of LiCoO2 thin-film electrodes for all-solid-state Li-ion micro-batteries ME Donders, WM Arnoldbik, HCM Knoops, WMM Kessels, PHL Notten Journal of the Electrochemical Society 160 (5), A3066, 2013 | 128 | 2013 |
| Deposition of TiN and TaN by remote plasma ALD for Cu and Li diffusion barrier applications HCM Knoops, L Baggetto, E Langereis, MCM Van De Sanden, ... Journal of the Electrochemical Society 155 (12), G287, 2008 | 122 | 2008 |
| Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma HCM Knoops, EMJ Braeken, K de Peuter, SE Potts, S Haukka, V Pore, ... ACS applied materials & interfaces 7 (35), 19857-19862, 2015 | 117 | 2015 |
| Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS 2: large area, thickness control and tuneable morphology A Sharma, MA Verheijen, L Wu, S Karwal, V Vandalon, HCM Knoops, ... Nanoscale 10 (18), 8615-8627, 2018 | 115 | 2018 |
| Tuning material properties of oxides and nitrides by substrate biasing during plasma-enhanced atomic layer deposition on planar and 3D substrate topographies T Faraz, HCM Knoops, MA Verheijen, CAA Van Helvoirt, S Karwal, ... ACS applied materials & interfaces 10 (15), 13158-13180, 2018 | 109 | 2018 |
| Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition E Langereis, HCM Knoops, AJM Mackus, F Roozeboom, ... Journal of Applied Physics 102 (8), 2007 | 102 | 2007 |
| Remote plasma atomic layer deposition of Co3O4 thin films ME Donders, HCM Knoops, WMM Kessels, PHL Notten Journal of The Electrochemical Society 158 (4), G92, 2011 | 97 | 2011 |
| Enhanced doping efficiency of Al-doped ZnO by atomic layer deposition using dimethylaluminum isopropoxide as an alternative aluminum precursor Y Wu, SE Potts, PM Hermkens, HCM Knoops, F Roozeboom, ... Chemistry of Materials 25 (22), 4619-4622, 2013 | 95 | 2013 |
| Low-temperature plasma-assisted atomic layer deposition of silicon nitride moisture permeation barrier layers AM Andringa, A Perrotta, K de Peuter, HCM Knoops, WMM Kessels, ... ACS applied materials & interfaces 7 (40), 22525-22532, 2015 | 94 | 2015 |
| Electron Scattering and Doping Mechanisms in Solid-Phase-Crystallized In2O3:H Prepared by Atomic Layer Deposition B Macco, HCM Knoops, WMM Kessels ACS applied materials & interfaces 7 (30), 16723-16729, 2015 | 90 | 2015 |
| Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes AJM Mackus, SBS Heil, E Langereis, HCM Knoops, MCM Van de Sanden, ... Journal of Vacuum Science & Technology A 28 (1), 77-87, 2010 | 90 | 2010 |
