MoS2 Field-Effect Transistor with Sub-10 nm Channel Length A Nourbakhsh, A Zubair, RN Sajjad, A Tavakkoli KG, W Chen, S Fang, ... Nano Letters 16 (12), 7798-7806, 2016 | 458 | 2016 |
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films AT KG, KW Gotrik, AF Hannon, A Alexander-Katz, CA Ross, KK Berggren Science 336 (6086), 1294-1298, 2012 | 288 | 2012 |
Multilayer block copolymer meshes by orthogonal self-assembly AT KG, SM Nicaise, KR Gadelrab, A Alexander-Katz, CA Ross, ... Nature Communications 7, 2016 | 104 | 2016 |
Generation of pronounced Fano resonances and tuning of subwavelength spatial light distribution in plasmonic pentamers M Rahmani, B Lukiyanchuk, B Ng, A Tavakkoli KG, YF Liew, MH Hong Optics express 19 (6), 4949-4956, 2011 | 87 | 2011 |
Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer AT KG, AF Hannon, KW Gotrik, A Alexander‐Katz, CA Ross, KK Berggren Advanced Materials, 2012 | 34* | 2012 |
Rectangular symmetry morphologies in a topographically templated block copolymer A Tavakkoli KG, AF Hannon, KW Gotrik, A Alexander-Katz, CA Ross, ... Wiley Blackwell, 2012 | 34 | 2012 |
Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly A Tavakkoli KG, SM Nicaise, AF Hannon, KW Gotrik, A Alexander‐Katz, ... Small 10 (3), 493-499, 2014 | 28 | 2014 |
Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly A Tavakkoli KG, SM Nicaise, AF Hannon, KW Gotrik, A Alexander‐Katz, ... Small 10 (3), 493-499, 2014 | 26 | 2014 |
Magnetostatic interaction effects in switching field distribution of conventional and staggered bit-patterned media M Ranjbar, AT KG, SN Piramanayagam, KP Tan, R Sbiaa, SK Wong, ... Journal of Physics D: Applied Physics 44 (26), 265005, 2011 | 23 | 2011 |
Path to achieve sub-10-nm half-pitch using electron beam lithography A Tavakkoli KG, SN Piramanayagam, M Ranjbar, R Sbiaa, TC Chong Journal of Vacuum Science & Technology B 29 (1), 2011 | 23 | 2011 |
Removable templates for directed self assembly ATK Ghariehali, SM Nicaise, KK Berggren, KW Gotrik, CA Ross US Patent 9,478,429, 2016 | 14 | 2016 |
Characterization of high‐density bit‐patterned media using ultra‐high resolution magnetic force microscopy SN Piramanayagam, M Ranjbar, R Sbiaa, A Tavakkoli KG, TC Chong physica status solidi (RRL)–Rapid Research Letters 6 (3), 141-143, 2012 | 14 | 2012 |
Comparison of fine and conventional blanking based on ductile fracture criteria FR Biglari, AT Kermani, MH Parsa, KM Nikbin, NP O’Dowd ASME 7th Biennial Conference on Engineering Systems Design and Analysis, 265-270, 2004 | 13 | 2004 |
Serially connected monolayer MoS2FETs with channel patterned by a 7.5 nm resolution directed self-assembly lithography A Nourbakhsh, A Zubair, A Tavakkoli, R Sajjad, X Ling, M Dresselhaus, ... 2016 IEEE Symposium on VLSI Technology, 1-2, 2016 | 10 | 2016 |
Self-assembly of block copolymers by graphoepitaxy SM Nicaise, KGA Tavakkoli, KK Berggren Directed Self-assembly of Block Co-polymers for Nano-manufacturing, 199-232, 2015 | 10 | 2015 |
Reverse nanoimprint lithography for fabrication of nanostructures A Tavakkoli KG, M Ranjbar, SN Piramanayagam, SK Wong, WC Poh, ... Nanoscience and Nanotechnology Letters 4 (8), 835-838, 2012 | 10 | 2012 |
Reverse nanoimprint lithography for fabrication of nanostructures A Tavakkoli KG, M Ranjbar, SN Piramanayagam, SK Wong, WC Poh, ... Nanoscience and Nanotechnology Letters 4 (8), 835-838, 2012 | 10 | 2012 |
Rapid shear alignment of sub-10 nm cylinder-forming block copolymer films based on thermal expansion mismatch SM Nicaise, KR Gadelrab, AT KG, CA Ross, A Alexander-Katz, ... Nano Futures 1 (3), 035006, 2018 | 5 | 2018 |
Apparatus for imprint lithography comprising a logic element configured to generate a fluid droplet pattern and a method of using such apparatus ATK Ghariehali, EB Fletcher US Patent App. 15/804,433, 2019 | 4 | 2019 |
System and method for illuminating edges of an imprint field with a gradient dosage ATK Ghariehali US Patent 10,976,657, 2021 | 2 | 2021 |