| Preparation of chalcogenide thin films using electrodeposition method for solar cell applications–A review R Manivannan, SN Victoria Solar Energy 173, 1144-1157, 2018 | 104 | 2018 |
| Evaluation of double sided lapping using a fixed abrasive pad for sapphire substrates HM Kim, R Manivannan, DJ Moon, H Xiong, JG Park Wear 302 (1-2), 1340-1344, 2013 | 103 | 2013 |
| Scratch formation and its mechanism in chemical mechanical planarization (CMP) TY Kwon, M Ramachandran, JG Park Friction 1, 279-305, 2013 | 98 | 2013 |
| Psidium guajava leaf extract as green corrosion inhibitor for mild steel in phosphoric acid SN Victoria, R Prasad, R Manivannan International Journal of electrochemical science 10 (3), 2220-2238, 2015 | 92 | 2015 |
| On the mechanism of material removal by fixed abrasive lapping of various glass substrates BJ Cho, HM Kim, R Manivannan, DJ Moon, JG Park Wear 302 (1-2), 1334-1339, 2013 | 69 | 2013 |
| The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasives R Manivannan, S Ramanathan Applied Surface Science 255 (6), 3764-3768, 2009 | 67 | 2009 |
| Azadirachta indica leaves extract as inhibitor for microbial corrosion of copper by Arthrobacter sulfureus in neutral pH conditions—a remedy to blue green water problem BS Swaroop, SN Victoria, R Manivannan Journal of the Taiwan Institute of Chemical Engineers 64, 269-278, 2016 | 62 | 2016 |
| Characterization of non-amine-based post-copper chemical mechanical planarization cleaning solution R Manivannan, BJ Cho, X Hailin, S Ramanathan, JG Park Microelectronic engineering 122, 33-39, 2014 | 50 | 2014 |
| Simple one-pot sonochemical synthesis of copper sulphide nanoparticles for solar cell applications A Singh, R Manivannan, SN Victoria Arabian Journal of Chemistry 12 (8), 2439-2447, 2019 | 42 | 2019 |
| Role of abrasives in high selectivity STI CMP slurries R Manivannan, S Ramanathan Microelectronic Engineering 85 (8), 1748-1753, 2008 | 41 | 2008 |
| Metal corrosion induced by microbial activity–mechanism and control options SN Victoria, A Sharma, R Manivannan Journal of the Indian Chemical Society 98 (6), 100083, 2021 | 31 | 2021 |
| Visible range photocatalysts for solid phase photocatalytic degradation of polyethylene and polyvinyl chloride A Gupta, YN Lakshmp, R Manivannan, SN Victoria Journal of the Chilean Chemical Society 62 (1), 3393-3398, 2017 | 31 | 2017 |
| Effect of pH and sulfur precursor concentration on electrochemically deposited CZTS thin films using glycine as the complexing agent A Paraye, R Sani, M Ramachandran, NV Selvam Applied Surface Science 435, 1249-1256, 2018 | 29 | 2018 |
| Abrasive and additive interactions in high selectivity STI CMP slurries BVS Praveen, R Manivannan, TD Umashankar, BJ Cho, JG Park, ... Microelectronic Engineering 114, 98-104, 2013 | 29 | 2013 |
| Electrochemical investigation of the corrosion inhibition mechanism of Tectona grandis leaf extract for SS304 stainless steel in hydrochloric acid SNV K Sumithra, K Yadav, R Manivannan Corrosion Reviews, 2017 | 24 | 2017 |
| The impact of diamond conditioners on scratch formation during chemical mechanical planarization (CMP) of silicon dioxide TY Kwon, M Ramachandran, BJ Cho, AA Busnaina, JG Park Tribology International 67, 272-277, 2013 | 23 | 2013 |
| A study on synthesis of nickel nanoparticles using chemical reduction technique A Pandey, R Manivannan Recent Patents on Nanomedicine 5 (1), 33-37, 2015 | 22 | 2015 |
| Investigation of Source-Based Scratch Formation During Oxide Chemical Mechanical Planarization TY Kwon, BJ Cho, M Ramachandran, AA Busnaina, JG Park Tribology letters 50 (2), 169-175, 2013 | 18 | 2013 |
| Mechanism of high selectivity in ceria based shallow trench isolation chemical mechanical polishing slurries R Manivannan, SN Victoria, S Ramanathan Thin Solid Films 518 (20), 5737-5740, 2010 | 17 | 2010 |
| Sodium hypochlorite as an oxidizing agent in silica based ruthenium chemical mechanical planarization slurry K Yadav, JC Bisen, SN Victoria, R Manivannan Microelectronic Engineering 180, 96-100, 2017 | 16 | 2017 |
S Noyel VictoriaAsst. Professor, National Institute of Technology Raipur在 nitrr.ac.in 的电子邮件经过验证
