| Plasma process uniformity diagnosis technique using optical emission spectroscopy with spatially resolved ring lens IJ Kim, I Yun IEEE Transactions on Industrial Electronics 63 (9), 5674-5681, 2016 | 15 | 2016 |
| Real-time plasma monitoring technique using incident-angle-dependent optical emission spectroscopy for computer-integrated manufacturing IJ Kim, I Yun Robotics and Computer-Integrated Manufacturing 52, 17-23, 2018 | 10 | 2018 |
| Real-time plasma uniformity measurement technique using optical emission spectroscopy with revolving module IJ Kim, I Yun IEEE Sensors Journal 19 (6), 2356-2361, 2018 | 7 | 2018 |
| Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system IJ Kim, YH Shin, I Yun 2015 International Conference on Electronics Packaging and iMAPS All Asia …, 2015 | 7 | 2015 |
| Methods Of Cleaning And Plasma Processing Apparatus For Manufacturing Semiconductors JUN Hyun-Su, H Yi, SJ Jeon, SY Kim, IJ Kim US Patent App. 13/176,868, 2012 | 7 | 2012 |
| Tube-type lens, optical emission spectroscopy (OES) apparatus including the tube-type lens, plasma monitoring system including the OES apparatus, and method of manufacturing … IJ Kim, YUN Ilgu US Patent 10,107,681, 2018 | 6 | 2018 |
| Real-time plasma uniformity monitoring via selective plasma light intensity measurement using transparent-LCD-module-adapted optical emission spectroscopy IJ Kim, C Park, D Shin, I Yun IEEE Sensors Journal 21 (2), 2256-2262, 2020 | 5 | 2020 |
| Apparatus for optical emission spectroscopy and plasma treatment apparatus IJ Kim, YUN Ilgu US Patent 9,721,768, 2017 | 5 | 2017 |
| OES device, plasma processing apparatus including the same and method of fabricating semiconductor device IJ Kim, IG Yun US Patent 10,770,273, 2020 | | 2020 |
| Plasma processing method of semiconductor manufacturing apparatus JUN Hyun-Su, K Kim, SH Lee, JB Kim, MW Choi, IJ Kim US Patent 9,048,189, 2015 | | 2015 |
