关注
James Huang
James Huang
在 ucsd.edu 的电子邮件经过验证
标题
引用次数
引用次数
年份
Cascaded enzyme reactions over a three-dimensional, wireframe DNA origami scaffold
JS Kahn, Y Xiong, J Huang, O Gang
Jacs Au 2 (2), 357-366, 2022
332022
Local environment affects the activity of enzymes on a 3D molecular scaffold
Y Xiong, J Huang, ST Wang, S Zafar, O Gang
ACS nano 14 (11), 14646-14654, 2020
322020
Selective Pulsed Chemical Vapor Deposition of Water-Free TiO2/Al2O3 and HfO2/Al2O3 Nanolaminates on Si and SiO2 in Preference to SiCOH
J Huang, Y Cho, Z Zhang, A Jan, KT Wong, SD Nemani, E Yieh, ...
ACS Applied Materials & Interfaces 14 (13), 15716-15727, 2022
112022
Sub-nanometer interfacial oxides on highly oriented pyrolytic graphite and carbon nanotubes enabled by lateral oxide growth
Z Zhang, M Passlack, G Pitner, CH Kuo, ST Ueda, J Huang, H Kashyap, ...
ACS Applied Materials & Interfaces 14 (9), 11873-11882, 2022
112022
Inherently selective water-free deposition of titanium dioxide on the nanoscale: implications for nanoscale patterning
Y Cho, CF Ahles, JY Choi, J Huang, A Jan, K Wong, S Nemani, E Yieh, ...
ACS Applied Nano Materials 5 (1), 476-485, 2022
102022
Inherent selective pulsed chemical vapor deposition of aluminum oxide in nm scale
Y Cho, J Huang, Z Zhang, K Wang, P Lee, C Kim, K Wong, S Nemani, ...
Applied Surface Science 622, 156824, 2023
82023
Inherent selective pulsed chemical vapor deposition of amorphous hafnium oxide/titanium oxide nanolaminates
Y Cho, J Huang, CF Ahles, Z Zhang, K Wong, S Nemani, E Yieh, ...
Applied Surface Science 600, 154010, 2022
82022
Gallium phosphide conformal film growth on in-situ tri-TBP dry-cleaned InGaP/GaAs using atomic hydrogen ALD
SU Yun, PC Lee, CH Kuo, AJ Mcleod, Z Zhang, V Wang, J Huang, ...
Vacuum 220, 112806, 2024
72024
Low-k SiOx/AlOx Nanolaminate Dielectric on Dielectric Achieved by Hybrid Pulsed Chemical Vapor Deposition
J Huang, J Mu, Y Cho, C Winter, V Wang, Z Zhang, K Wang, C Kim, ...
ACS Applied Materials & Interfaces 15 (48), 56556-56566, 2023
52023
Dielectric-on-Dielectric Achieved on SiO2 in Preference to W by Water-free Chemical Vapor Depositions with Aniline Passivation
J Huang, Y Cho, V Wang, Z Zhang, J Mu, A Yadav, K Wong, S Nemani, ...
ACS Applied Materials & Interfaces 15 (21), 26128-26137, 2023
32023
Low-Resistivity Titanium Nitride Thin Films Fabricated by Atomic Layer Deposition with TiCl4 and Metal–Organic Precursors in Horizontal Vias
CH Kuo, AJ Mcleod, PC Lee, J Huang, H Kashyap, V Wang, SUK Yun, ...
ACS Applied Electronic Materials 5 (8), 4094-4102, 2023
22023
Selective Oxide Pulsed Chemical Vapor Deposition for Dielectric on Metal and Dielectric on Dielectric
J Huang
University of California, San Diego, 2023
2023
Selective Pulsed Chemical Vapor Deposition of Water-Free TiO₂/Al₂O₃ and HfO₂/Al₂O₃ Nanolaminates on Si and SiO₂ in Preference to SiCOH
J Huang, Y Cho, Z Zhang, A Jan, KT Wong, SD Nemani, E Yieh, ...
2022
Selective deposition of metal oxide by pulsed chemical vapor deposition
KT Wong, SD Nemani, AC Kummel, J Huang, Y CHO
US Patent US11542597B2, 2021
2021
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