| Active MnOx Electrocatalysts Prepared by Atomic Layer Deposition for Oxygen Evolution and Oxygen Reduction Reactions KL Pickrahn, SW Park, Y Gorlin, HBR Lee, TF Jaramillo, SF Bent Advanced Energy Materials 2 (10), 1269-1277, 2012 | 350 | 2012 |
| Creating highly active atomic layer deposited NiO electrocatalysts for the oxygen evolution reaction KL Nardi, N Yang, CF Dickens, AL Strickler, SF Bent Advanced Energy Materials 5 (17), 1500412, 2015 | 266 | 2015 |
| Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition JR Bakke, KL Pickrahn, TP Brennan, SF Bent Nanoscale 3 (9), 3482-3508, 2011 | 208 | 2011 |
| Methods for making euv patternable hard masks C Wu, TW Weidman, KL Nardi US Patent App. 15/733,598, 2021 | 199 | 2021 |
| Area-selective atomic layer deposition assisted by self-assembled monolayers: A comparison of Cu, Co, W, and Ru D Bobb-Semple, KL Nardi, N Draeger, DM Hausmann, SF Bent Chemistry of Materials 31 (5), 1635-1645, 2019 | 172 | 2019 |
| Nanoscale limitations in metal oxide electrocatalysts for oxygen evolution V Viswanathan, KL Pickrahn, AC Luntz, SF Bent, JK Nørskov Nano letters 14 (10), 5853-5857, 2014 | 78 | 2014 |
| Improving area-selective molecular layer deposition by selective SAM removal C Prasittichai, KL Pickrahn, FS Minaye Hashemi, DS Bergsman, SF Bent ACS Applied Materials & Interfaces 6 (20), 17831-17836, 2014 | 64 | 2014 |
| Applications of ALD MnO to electrochemical water splitting KL Pickrahn, Y Gorlin, LC Seitz, A Garg, D Nordlund, TF Jaramillo, ... Physical Chemistry Chemical Physics 17 (21), 14003-14011, 2015 | 57 | 2015 |
| Effect of O3 on Growth of Pt by Atomic Layer Deposition HBR Lee, KL Pickrahn, SF Bent The Journal of Physical Chemistry C 118 (23), 12325-12332, 2014 | 52 | 2014 |
| ALD of ultrathin ternary oxide electrocatalysts for water splitting KL Pickrahn, A Garg, SF Bent ACS Catalysis 5 (3), 1609-1616, 2015 | 46 | 2015 |
| Formation and ripening of self-assembled multilayers from the vapor-phase deposition of dodecanethiol on copper oxide DS Bergsman, TL Liu, RG Closser, KL Nardi, N Draeger, DM Hausmann, ... Chemistry of materials 30 (16), 5694-5703, 2018 | 45 | 2018 |
| Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition TL Liu, KL Nardi, N Draeger, DM Hausmann, SF Bent ACS Applied Materials & Interfaces 12 (37), 42226-42235, 2020 | 34 | 2020 |
| Relationship between microstructure, dynamics, and rheology in polymer-bridging colloidal gels K Pickrahn, B Rajaram, A Mohraz Langmuir 26 (4), 2392-2400, 2010 | 32 | 2010 |
| Characterizing self-assembled monolayer breakdown in area-selective atomic layer deposition TL Liu, L Zeng, KL Nardi, DM Hausmann, SF Bent Langmuir 37 (39), 11637-11645, 2021 | 21 | 2021 |
| Lithographic performance of the first entirely dry process for EUV lithography M Alvi, D Dries, R Gottscho, K Gu, B Kam, S Kanakasabapathy, D Li, ... EUVL Workshop, 2020 | 5 | 2020 |
| Methods for making hard masks useful in next-generation lithography TW Weidman, K Nardi, C Wu US Patent 11,921,427, 2024 | 2 | 2024 |
| Interface engineering during MGO deposition for magnetic tunnel junctions KL Nardi, NS Draeger US Patent 9,988,715, 2018 | 2 | 2018 |
| Selective etch using a sacrificial mask D Peter, D Li, J Yu, A Kabansky, K Nardi, SSH Tan, Y Lee US Patent App. 17/428,560, 2022 | | 2022 |
| (Invited) Challenges and Opportunities for Selective Area Processing in High Volume Manufacturing (HVM) K Sharma, P Lemaire, K Nardi, D Hausmann Electrochemical Society Meeting Abstracts 236, 1140-1140, 2019 | | 2019 |
| Approaches to atomic-scale engineering through selective processes K Nardi, N Draeger, D Hausmann, D Smith ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 255, 2018 | | 2018 |
Stacey BentProfessor of Chemical Engineering, Stanford University在 stanford.edu 的电子邮件经过验证
