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Shiva Rajavelu
Shiva Rajavelu
PRINCIPAL HEAT AND MASS TRANSFER ARCHITECT, ASML
在 asml.com 的电子邮件经过验证
标题
引用次数
引用次数
年份
Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
S Rajavelu, J Tolle, R McCartney
US Patent App. 15/962,980, 2018
3342018
Runout and wobble measurement fixtures
AN Patil, S Rathi, S Kim, SKTR Muralidhar
US Patent App. 18/609,379, 2024
2024
Substrate retaining apparatus, system including the apparatus, and method of using same
SKTR Muralidhar, S Kim, JB Robinson, JK Wilson Jr, NV Sonje
US Patent App. 18/402,969, 2024
2024
Runout and wobble measurement fixtures
AN Patil, S Rathi, S Kim, SKTR Muralidhar
US Patent 11,946,137, 2024
2024
Semiconductor processing chamber with filament lamps having nonuniform heat output
SKTR Muralidhar, S Kim
US Patent App. 18/496,081, 2024
2024
Method and apparatus for transmittance measurements of large articles
SKTR Muralidhar, Y Alvandi-Tabrizi, J Disanto, S Kim
US Patent App. 18/379,312, 2024
2024
Substrate retaining apparatus, system including the apparatus, and method of using same
SKTR Muralidhar, S Kim, JB Robinson, JK Wilson Jr, NV Sonje
US Patent 11,885,023, 2024
2024
Semiconductor processing chamber with filament lamps having nonuniform heat output
SKTR Muralidhar, S Kim
US Patent 11,842,908, 2023
2023
Method and apparatus for transmittance measurements of large articles
SKTR Muralidhar, Y Alvandi-Tabrizi, J Disanto, S Kim
US Patent 11,828,707, 2023
2023
Susceptor for semiconductor substrate processing
S Rathi, SKTR Muralidhar, S Luan, A Demos, X Lin
US Patent 11,764,101, 2023
2023
Apparatus for recovery of euv target material
SKTR MURALIDHAR, Y Ma, NV Dziomkina, AH GANDHI, DS DEBRUIN, ...
WO Patent WO2023110321A1, 2023
2023
Process chamber with side support
Y Alvandi-Tabrizi, J Disanto, SKTR Muralidhar
US Patent App. 17/154,851, 2021
2021
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