| Status and prospects of plasma-assisted atomic layer deposition H Knoops, T Faraz, K Arts, WMM Kessels Journal of Vacuum Science & Technology A 37 (3), 2019 | 183 | 2019 |
| Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition? T Faraz, F Roozeboom, HCM Knoops, WMM Kessels ECS Journal of Solid State Science and Technology 4 (6), N5023-N5032, 2015 | 163 | 2015 |
| Tuning material properties of oxides and nitrides by substrate biasing during plasma-enhanced atomic layer deposition on planar and 3D substrate topographies T Faraz, HCM Knoops, MA Verheijen, CAA Van Helvoirt, S Karwal, ... ACS applied materials & interfaces 10 (15), 13158-13180, 2018 | 109 | 2018 |
| Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties T Faraz, K Arts, S Karwal, HCM Knoops, WMM Kessels Plasma Sources Science and Technology 28 (2), 024002, 2019 | 77 | 2019 |
| Area-selective atomic layer deposition of TiN using aromatic inhibitor molecules for metal/dielectric selectivity MJM Merkx, S Vlaanderen, T Faraz, MA Verheijen, WMM Kessels, ... Chemistry of Materials 32 (18), 7788-7795, 2020 | 60 | 2020 |
| Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies T Faraz, M van Drunen, HCM Knoops, A Mallikarjunan, I Buchanan, ... ACS Applied Materials & Interfaces 9 (2), 1858-1869, 2017 | 52 | 2017 |
| Benefits of concentrating solar power over solar photovoltaic for power generation in Bangladesh T Faraz 2nd International Conference on the Developments in Renewable Energy …, 2012 | 47 | 2012 |
| Low resistivity HfN x grown by plasma-assisted ALD with external rf substrate biasing S Karwal, MA Verheijen, BL Williams, T Faraz, WMM Kessels, M Creatore Journal of Materials Chemistry C 6 (15), 3917-3926, 2018 | 35 | 2018 |
| Precise ion energy control with tailored waveform biasing for atomic scale processing T Faraz, YGP Verstappen, MA Verheijen, NJ Chittock, JE Lopez, E Heijdra, ... Journal of Applied Physics 128 (21), 2020 | 34 | 2020 |
| Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study V Beladiya, M Becker, T Faraz, WMME Kessels, P Schenk, F Otto, T Fritz, ... Nanoscale 12 (3), 2089-2102, 2020 | 24 | 2020 |
| Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers S Balasubramanyam, MA Bloodgood, M van Ommeren, T Faraz, ... ACS applied materials & interfaces 12 (3), 3873-3885, 2019 | 22 | 2019 |
| Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure S Karwal, MA Verheijen, K Arts, T Faraz, WMM Kessels, M Creatore Plasma Chemistry and Plasma Processing 40, 697-712, 2020 | 19 | 2020 |
| Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al (CH3) 3 NJ Chittock, MFJ Vos, T Faraz, WMM Kessels, H Knoops, AJM Mackus Applied Physics Letters 117 (16), 2020 | 18 | 2020 |
| Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate K Arts, JH Deijkers, T Faraz, RL Puurunen, WMM Kessels, HCM Knoops Applied Physics Letters 117 (3), 2020 | 17 | 2020 |
| Solar battery charging station and torque sensor based electrically assisted tricycle T Faraz, A Azad 2012 IEEE Global Humanitarian Technology Conference, 18-22, 2012 | 17 | 2012 |
| Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing V Beladiya, T Faraz, WMM Kessels, A Tünnermann, A Szeghalmi Advances in Optical Thin Films VI 10691, 36-48, 2018 | 12 | 2018 |
| Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors V Beladiya, T Faraz, P Schmitt, AS Munser, S Schröder, S Riese, ... ACS Applied Materials & Interfaces 14 (12), 14677-14692, 2022 | 8 | 2022 |
| Expanding the toolbox of atomic scale processing T Faraz | 3 | 2019 |
| Nucleation of microcrystalline silicon: on the effect of the substrate surface nature and nano-imprint topography J Palmans, T Faraz, MA Verheijen, WMM Kessels, M Creatore Journal of Physics D: Applied Physics 49 (5), 055205, 2016 | 2 | 2016 |
| Etching with atomic-level precision: The emerging field of atomic layer etching AJM Mackus, T Faraz, N Chittock Nevac Blad 58 (2), 40-42, 2020 | 1 | 2020 |
Harm KnoopsEindhoven University of Technology在 tue.nl 的电子邮件经过验证
