Unintended gas breakdowns in narrow gaps of advanced plasma sources for semiconductor fabrication industry SH Son, G Go, W Villafana, ID Kaganovich, A Khrabrov, HC Lee, ... Applied Physics Letters 123 (23), 2023 | 5 | 2023 |
Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma H Lee, NK Kim, MG Lee, JW Kwon, SH Son, N Bae, T Park, S Park, ... Plasma Sources Science and Technology 31 (8), 084006, 2022 | 5 | 2022 |
In-Situ Diagnostic of Channel Erosion in Hall Thrusters I Romadanov, I Mishra, J Kiviat, SH Son, B Benjadol, A Ottaviano, ... AIAA SCITECH 2024 Forum, 0691, 2024 | 1 | 2024 |
Kinetic simulation of narrow gap discharge JY Kim, SH Son, G Go, KJ Chung, I Kaganovich APS Annual Gaseous Electronics Meeting Abstracts, FM2. 007, 2022 | 1 | 2022 |
Measurements of two-dimensional ion velocity distributions in electron beam generated E x B plasma S Son, I Romadanov, N Chopra, Y Raitses Bulletin of the American Physical Society, 2024 | | 2024 |
Mechanism of unintended breakdowns in advanced plasma sources in the semiconductor Industry W Villafana, I Kaganovich, S Son Bulletin of the American Physical Society, 2024 | | 2024 |
Reconstruction of magnetic island electron temperature in mixed second and third harmonic electron cyclotron emission conditions E Jung, L Bardóczi, ME Austin, SH Son, AH Reiman Review of Scientific Instruments 95 (6), 2024 | | 2024 |
2D Kinetic Simulation of Partially Magnetized Capacitively Coupled Plasma Sources SH Son, J Park, KJ Chung Journal of the Semiconductor & Display Technology 22 (1), 118-123, 2023 | | 2023 |
Etch Profile Analysis on Taper angle using Convolution Neural Network in Narrow Gap VHF+ LF driven CCP J Park, J Song, T Park, SH Son, H Lee, GH Kim APS Annual Gaseous Electronics Meeting Abstracts, HW6. 070, 2022 | | 2022 |
Analysis of Si Etch Uniformity of Very High Frequency Driven-Capacitively Coupled Ar/SF6 Plasmas S Lim, I Lee, H Lee, SH Son, GH Kim Journal of the Semiconductor & Display Technology 20 (4), 72-77, 2021 | | 2021 |
Influence of Wall Conditioning State on AR Plasma Emission in a Processing Chamber J Song, J Kim, DC Kim, MY Song, JS Yoon, SH Son, JW Kwon, S Ryu, ... 2020 IEEE International Conference on Plasma Science (ICOPS), 95-95, 2020 | | 2020 |