| Systematic Design of Jettable Nanoparticle-Based Inkjet Inks: Rheology, Acoustics, and Jettability HC Nallan, JA Sadie, R Kitsomboonloha, SK Volkman, V Subramanian Langmuir 30 (44), 13470-13477, 2014 | 149 | 2014 |
| Fully Inkjet‐Printed Transparent Oxide Thin Film Transistors Using a Fugitive Wettability Switch J Jang, H Kang, HCN Chakravarthula, V Subramanian Advanced Electronic Materials 1 (7), 1500086, 2015 | 132 | 2015 |
| Long-life LiNi0. 5Mn1. 5O4/graphite lithium-ion cells with an artificial graphite-electrolyte interface F Zou, HC Nallan, A Dolocan, Q Xie, J Li, BM Coffey, JG Ekerdt, ... Energy Storage Materials 43, 499-508, 2021 | 37 | 2021 |
| Atomic layer deposition of cobalt oxide on oxide substrates and low temperature reduction to form ultrathin cobalt metal films Z Zhang, HC Nallan, BM Coffey, TQ Ngo, T Pramanik, SK Banerjee, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 37 (1 …, 2019 | 19 | 2019 |
| Long-Term Cycling of a Mn-Rich High-Voltage Spinel Cathode by Stabilizing the Surface with a Small Dose of Iron F Zou, Z Cui, HC Nallan, JG Ekerdt, A Manthiram ACS Applied Energy Materials 4 (11), 13297-13306, 2021 | 12 | 2021 |
| Vacuum Ultraviolet-Enhanced Oxidation—A Route to the Atomic Layer Etching of Palladium Metal BM Coffey, HC Nallan, JR Engstrom, CH Lam, JG Ekerdt Chemistry of Materials 32 (14), 6035-6042, 2020 | 12 | 2020 |
| Vacuum ultraviolet enhanced atomic layer etching of ruthenium films BM Coffey, HC Nallan, JG Ekerdt Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 39 (1 …, 2021 | 11 | 2021 |
| Low temperature, area-selective atomic layer deposition of NiO and Ni HC Nallan, X Yang, BM Coffey, JG Ekerdt Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 40 (6 …, 2022 | 3 | 2022 |
| A Vacuum Ultraviolet-Enhanced Oxidation Mechanism for Pd: Near-Surface Oxidation for Atomic Layer Etching BM Coffey, HC Nallan, JR Engstrom, JG Ekerdt ACS Applied Materials & Interfaces 12 (45), 50985-50995, 2020 | 3 | 2020 |
| Low temperature area-selective atomic layer deposition of NiO, Ni and Pd for next-generation nanomanufacturing H Nallan Chakravarthula | | 2022 |
| Area Selective Deposition of Ultrathin Magnetic Cobalt Films via Atomic Layer Deposition H Nallan, T Ngo, A Posadas, A Demkov, J Ekerdt | | 2016 |
| Systematic Ink Design and Solubility Enhancement via Genetic Algorithm for Nanoparticle-based Inkjet Inks J Sadie, H Nallan, S Volkman, V Subramanian NIP & Digital Fabrication Conference 2015 (1), 439-442, 2015 | | 2015 |
| Jacob Sadie V Subramanian, MC Wu, H Nallan, J Ballato University of California, Berkeley 2015, 2010 | | 2010 |
