| Programmable polymer thin film and non-volatile memory device J Ouyang, CW Chu, CR Szmanda, L Ma, Y Yang Nature materials 3 (12), 918-922, 2004 | 1061 | 2004 |
| Chemically amplified resists AA Lamola, CR Szmanda, JW Thackeray Solid State Technology 34 (8), 53-61, 1991 | 84 | 1991 |
| On the dissolution kinetics of positive photoresists: The secondary structure model MK Templeton, CR Szmanda, A Zampini Advances in Resist Technology and Processing IV 771, 136-147, 1987 | 78 | 1987 |
| Measuring acid generation efficiency in chemically amplified resists with all three beams CR Szmanda, RL Brainard, JF Mackevich, A Awaji, T Tanaka, Y Yamada, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 74 | 1999 |
| Simple method for measuring acid generation quantum efficiency at 193 nm CR Szmanda, RJ Kavanagh, JF Bohland, JF Cameron, P Trefonas III, ... Advances in Resist Technology and Processing XVI 3678, 857-866, 1999 | 68 | 1999 |
| Memory devices based on electric field programmable films Y Yang, J Ouyang, CR Szmanda US Patent 7,274,035, 2007 | 67 | 2007 |
| Coating compositions for use with an overcoated photoresist JW Thackeray, GB Wayton, CR Szmanda US Patent 7,585,612, 2009 | 57 | 2009 |
| Resolution, line-edge roughness, sensitivity tradeoff, and quantum yield of high photo acid generator resists for extreme ultraviolet lithography CD Higgins, CR Szmanda, A Antohe, G Denbeaux, J Georger, ... Japanese Journal of Applied Physics 50 (3R), 036504, 2011 | 56 | 2011 |
| The relationship between critical dimension shift and diffusion in negative chemically amplified resist systems TH Fedynyshyn, MF Cronin, CR Szmanda Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1991 | 44 | 1991 |
| Solvents and photoresist compositions for short wavelength imaging CR Szmanda, A Zampini US Patent 6,787,286, 2004 | 40 | 2004 |
| Memory devices based on electric field programmable films L Bu, E Cagin, C Cutler, D Gronbeck, C Szmanda US Patent App. 11/086,176, 2005 | 38 | 2005 |
| Resist dissolution kinetics and submicron process control CM Garza, CR Szmanda, RL Fischer Jr Advances in Resist Technology and Processing V 920, 321-338, 1988 | 38 | 1988 |
| Surface tension effects in microlithography-striations BK Daniels, CR Szmanda, MK Templeton, P Trefonas III Advances in Resist Technology and Processing III 631, 192-201, 1986 | 33 | 1986 |
| Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol A Zampini, DC Madoux, P Trefonas III, CR Szmanda US Patent 5,178,986, 1993 | 32 | 1993 |
| Film quantum yields of EUV and ultra-high PAG photoresists E Hassanein, C Higgins, P Naulleau, R Matyi, G Gallatin, G Denbeaux, ... Emerging Lithographic Technologies XII 6921, 453-465, 2008 | 30 | 2008 |
| Novel polymers and photoresist compositions comprising electronegative groups A Zampini, C Szmanda, S Cho, G Taylor US Patent App. 09/948,903, 2002 | 29 | 2002 |
| Relationship between resist performance and diffusion in chemically amplified resist systems TH Fedynyshyn, CR Szmanda, RF Blacksmith, WE Houck Advances in Resist Technology and Processing X 1925, 2-13, 1993 | 28 | 1993 |
| Evaluation of the standard addition method to determine rate constants for acid generation in chemically amplified photoresist at 157 nm AR Pawloski, CR Szmanda, PF Nealey Advances in Resist Technology and Processing XVIII 4345, 1056-1065, 2001 | 26 | 2001 |
| Polymers and photoresist compositions GN Taylor, CR Szmanda US Patent 6,057,083, 2000 | 25 | 2000 |
| Polymer and photoresist compositions CR Szmanda, GG Barclay, P Trefonas III, W Yueh US Patent 6,406,828, 2002 | 24 | 2002 |
