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Hari Pathangi
Hari Pathangi
imec, Leuven, Belgium
在 imec.be 的电子邮件经过验证
标题
引用次数
引用次数
年份
Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow
R Gronheid, PR Delgadillo, H Pathangi, D Van den Heuvel, D Parnell, ...
Alternative Lithographic Technologies VI 9049, 15-24, 2014
572014
Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
H Pathangi, BT Chan, H Bayana, N Vandenbroeck, DVD Heuvel, LV Look, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (3), 031204-031204, 2015
352015
Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals
N Gutman, E Amit, S Eyring, H Pathangi, F Laske, U Pohlmann, T Heidrich
US Patent 10,473,460, 2019
222019
Self-detecting gate-tunable nanotube paddle resonators
B Witkamp, M Poot, H Pathangi, AK Hüttel, HSJ Van der Zant
Applied Physics Letters 93 (11), 2008
222008
Using deep learning based defect detection and classification schemes for pixel level image quantification
H Pathangi, S Meenakshisundaram, T Bansal
US Patent 10,672,588, 2020
202020
Quantifying the aggregation factor in carbon nanotube dispersions by absorption spectroscopy
H Pathangi, PM Vereecken, A Klekachev, G Groeseneken, A Witvrouw
Journal of Nanoscience 2014 (1), 328627, 2014
182014
Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow
H Pathangi, BT Chan, H Bayana, N Vandenbroeck, D Van Den Heuvel, ...
Alternative Lithographic Technologies VII 9423, 106-120, 2015
162015
DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC
H Pathangi, V Vaid, BT Chan, N Vandenbroeck, J Li, SE Hong, Y Cao, ...
Alternative Lithographic Technologies VIII 9777, 84-89, 2016
132016
Dielectrophoretic assembly of suspended single-walled carbon nanotubes
H Pathangi, G Groeseneken, A Witvrouw
Microelectronic engineering 98, 218-221, 2012
132012
Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations
V Constantoudis, G Papavieros, E Gogolides, AV Pret, H Pathangi, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (2), 024001-024001, 2017
112017
Towards CMOS-compatible single-walled carbon nanotube resonators
H Pathangi, V Cherman, A Khaled, B Soree, G Groeseneken, A Witvrouw
Microelectronic engineering 107, 219-222, 2013
82013
Improved cost-effectiveness of the block co-polymer anneal process for DSA
H Pathangi, M Stokhof, W Knaepen, V Vaid, A Mallik, BT Chan, ...
Alternative Lithographic Technologies VIII 9777, 415-419, 2016
72016
Inspection-guided critical site selection for critical dimension measurement
JC Saraswatula, Y Arpit, H Pathangi
US Patent 11,035,666, 2021
32021
Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations
V Constantoudis, VKM Kuppuswamy, E Gogolides, AV Pret, H Pathangi, ...
Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016
22016
Optical defect inspection solution for EUV stochastics detection
V Anantha, R Babulnath, V Kannan, G Sharma, S Kumar, K Sah, A Cross, ...
Extreme Ultraviolet (EUV) Lithography XI 11323, 381-386, 2020
12020
Opportunities and Challenges for DSA in Logic and Memory
R Gronheid, A Singh, J Doise, C Boeckx, I Karageorgos, J Ryckaert, ...
12016
The use of eDR-71xx for DSA defect review and automated classification
H Pathangi, D Van Den Heuvel, H Bayana, L Bouckou, J Brown, P Parisi, ...
Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015
12015
Enabling scanning electron microscope imaging while preventing sample damage on sensitive layers used in semiconductor manufacturing processes
HS Pathangi
US Patent 11,631,602, 2023
2023
Using absolute Z-height values for synergy between tools
S Madhogarhia, HS Pathangi, R Bhat
US Patent 11,600,497, 2023
2023
USING DEEP LEARNING-BASED ERROR DETECTION AND CLASSIFICATION METHODS TO QUANTIFY IMAGE AT THE PIXEL LEVEL
H Pathangi, S MEENAKSHISUNDARAM, T BANSAL
2022
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