| Status and prospects of plasma-assisted atomic layer deposition H Knoops, T Faraz, K Arts, WMM Kessels Journal of Vacuum Science & Technology A 37 (3), 2019 | 196 | 2019 |
| Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties T Faraz, K Arts, S Karwal, HCM Knoops, WMM Kessels Plasma Sources Science and Technology 28 (2), 024002, 2019 | 78 | 2019 |
| Correlating the silicon surface passivation to the nanostructure of low-temperature a-Si: H after rapid thermal annealing B Macco, J Melskens, NJ Podraza, K Arts, C Pugh, O Thomas, ... Journal of Applied Physics 122 (3), 2017 | 48 | 2017 |
| Sticking Probabilities of H2O and Al(CH3)3 during Atomic Layer Deposition of Al2O3 Extracted from Their Impact on Film Conformality K Arts, V Vandalon, RL Puurunen, M Utriainen, F Gao, WMM Kessels, ... J. Vac. Sci. Technol., A 37, 030908, 2019 | 45* | 2019 |
| Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2 K Arts, M Utriainen, RL Puurunen, WMM Kessels, HCM Knoops The Journal of Physical Chemistry C 123 (44), 27030-27035, 2019 | 40 | 2019 |
| Surface zeta potential and diamond growth on gallium oxide single crystal S Mandal, K Arts, HCM Knoops, JA Cuenca, GM Klemencic, OA Williams Carbon 181, 79-86, 2021 | 35 | 2021 |
| Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 K Arts, H Thepass, MA Verheijen, RL Puurunen, WMM Kessels, ... Chemistry of Materials 33 (13), 5002-5009, 2021 | 28 | 2021 |
| Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure S Karwal, MA Verheijen, K Arts, T Faraz, WMM Kessels, M Creatore Plasma Chemistry and Plasma Processing 40, 697-712, 2020 | 23 | 2020 |
| Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile J Yim, E Verkama, JA Velasco, K Arts, RL Puurunen Physical Chemistry Chemical Physics 24 (15), 8645-8660, 2022 | 22 | 2022 |
| Foundations of atomic-level plasma processing in nanoelectronics K Arts, S Hamaguchi, T Ito, K Karahashi, HCM Knoops, AJM Mackus, ... Plasma Sources Science and Technology 31 (10), 103002, 2022 | 20 | 2022 |
| Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate K Arts, JH Deijkers, T Faraz, RL Puurunen, WMM Kessels, HCM Knoops Applied Physics Letters 117 (3), 2020 | 17 | 2020 |
| Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2 K Arts, S Deijkers, RL Puurunen, WMM Kessels, HCM Knoops The Journal of Physical Chemistry C 125 (15), 8244-8252, 2021 | 15 | 2021 |
| Broadband optical response of graphene measured by terahertz time-domain spectroscopy and FTIR spectroscopy K Arts, R Vervuurt, A Bhattacharya, J Gómez Rivas, JW Oosterbeek, ... Journal of Applied Physics 124 (7), 2018 | 13 | 2018 |
| Innovative remote plasma source for atomic layer deposition for GaN devices H Knoops, K Arts, JW Buiter, LM Martini, R Engeln, DT Hemakumara, ... Journal of Vacuum Science & Technology A 39 (6), 2021 | 8 | 2021 |
| Zeta potential and nanodiamond self assembly assisted diamond growth on lithium niobate and lithium tantalate single crystal S Mandal, K Arts, DJ Morgan, Z Chen, OA Williams Carbon 212, 118160, 2023 | 2 | 2023 |
| (Invited) Role of Low-Energy Ions during Plasma-Enhanced Atomic Layer Deposition K Arts, WMM Kessels, H Knoops Electrochemical Society Meeting Abstracts 240, 877-877, 2021 | | 2021 |
| Conformality and the role of ions during plasma-assisted atomic layer deposition K Arts | | 2021 |
| Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO 2, TiO 2, Al 2 O 3, and HfO 2 K Arts, M Utriainen, RL Puurunen, WMM Kessels, H Knoops JOURNAL OF PHYSICAL CHEMISTRY C 124 (1), 1250-1250, 2020 | | 2020 |
| Radical Surface Recombination Probabilities during Plasma ALD of SiO2, TiO2 and Al2O3 Determined from Film Conformality K Arts, M Utriainen, RL Puurunen, WMM Kessels, HCM Knoops 19th International Conference on Atomic Layer Deposition, ALD 2019, 2019 | | 2019 |
| Advanced Lateral High Aspect Ratio Test Structures for Conformality Characterization by Optical Microscopy OME Ylivaara, P Hyttinen, K Arts, F Gao, WMME Kessels, LP Riikka, ... 19th International Conference on Atomic Layer Deposition, ALD 2019, 2019 | | 2019 |
