| Effect of stress on fluorite-structured ferroelectric thin films for semiconductor devices Y Lee, HW Jeong, SH Kim, K Yang, MH Park Materials Science in Semiconductor Processing 160, 107411, 2023 | 15 | 2023 |
| Perspective on ferroelectric devices: lessons from interfacial chemistry K Yang, SH Kim, HW Jeong, DH Lee, GH Park, Y Lee, MH Park Chemistry of Materials 35 (6), 2219-2237, 2023 | 13 | 2023 |
| Mitigation of field-driven dynamic phase evolution in ferroelectric Hf0. 5Zr0. 5O2 films by adopting oxygen-supplying electrode Y Lee, SH Kim, HW Jeong, GH Park, J Lee, YY Kim, MH Park Applied Surface Science 648, 158948, 2024 | 8 | 2024 |
| An Investigation on the Low Voltage Ferroelectric Hf0.5Zr0.5O2 Capacitor Deposited on Phase-Controlled W Electrode K Yang, HW Jeong, JY Park, J Lee, H Choi, Y Lee, MH Park PRiME 2024 (October 6-11, 2024), 2024 | | 2024 |
| Ferroelectricity of Hf0. 5Zr0. 5O2 Thin Film Induced at 350° C by Thermally Accelerated Nucleation During Atomic Layer Deposition J Lee, SH Kim, H Choi, HW Jeong, K Yang, JY Park, YH Cho, SY Park, ... IEEE Transactions on Electron Devices 71 (4), 2690-2695, 2024 | | 2024 |
| Depolarization mitigated in ferroelectric Hf0.5Zr0.5O2 ultrathin films (< 5 nm) on Si substrate by interface engineering. SH Kim, Y Lee, DH Lee, GH Park, HW Jeong, K Yang, YH Cho, YY Kim, ... Journal of Advanced Ceramics 13 (3), 2024 | | 2024 |
| Ferroelectricity of HfZrO Thin Film Induced at 350 C by Thermally Accelerated Nucleation During Atomic Layer Deposition J Lee, SH Kim, H Choi, HW Jeong, K Yang, JY Park, YH Cho, SY Park, ... IEEE Transactions on Electron Devices, 2024 | | 2024 |
| A fluorite-structured HfO 2/ZrO 2/HfO 2 superlattice based self-rectifying ferroelectric tunnel junction synapse DH Lee, JE Kim, YH Cho, S Kim, GH Park, H Choi, SY Lee, T Kwon, ... Materials Horizons 11 (21), 5251-5264, 2024 | | 2024 |
| Low thermal budget HZO thin film by controlling deposition temperature J Lee, SH Kim, K Yang, HW Jeong, JY Park, MH Park 한국표면공학회 학술발표회 초록집, 220-220, 2023 | | 2023 |
| Enhanced Ferroelectricity and Alleviated Depolarization in Ultra-thin Hf0.5Zr0.5O₂-based MFIS capacitor by Interface Engineering SH Kim, HW Jeong, K Yang, GH Park, DH Lee, Y Lee, MH Park 한국표면공학회 학술발표회 초록집, 105-105, 2022 | | 2022 |
