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Hrishikesh Das
Hrishikesh Das
ON Semiconductor
在 onsemi.com 的电子邮件经过验证
标题
引用次数
引用次数
年份
Investigation of longitudinal-optical phonon-plasmon coupled modes in SiC epitaxial film using fourier transform infrared reflection
S Sunkari, MS Mazzola, JP Mazzola, H Das, JL Wyatt
Journal of electronic materials 34 (4), 320-323, 2005
222005
Statistical Analysis of Killer and Non-Killer Defects in SiC and the Impacts to Device Performance
H Das, S Sunkari, J Justice, H Pham, G Park, YH Seo
Materials Science Forum 1004, 458-463, 2020
192020
Effect of Defects in Silicon Carbide Epitaxial layers on Yield and Reliability
H Das, S Sunkari, J Justice, H Pham, KS Park
Materials Science Forum 963, 284-287, 2019
162019
Triangular defects in the low-temperature halo-carbon homoepitaxial growth of 4H-SiC
H Das, G Melnychuk, Y Koshka
Journal of Crystal Growth 312 (12-13), 1912-1919, 2010
152010
Heavily Aluminum-Doped Epitaxial Layers for Ohmic Contact Formation to p-Type 4H-SiC Produced by Low-Temperature Homoepitaxial Growth
B Krishnan, SP Kotamraju, G Melnychuk, H Das, JN Merrett, Y Koshka
Journal of electronic materials 39 (1), 34-38, 2010
122010
METHODS FOR THE EPITAXIAL GROWTH OF SILICON CARBIDE
H DAS, S SUNKARI, T OLDHAM, JB CASADY
WO Patent 2,013,036,376, 2013
10*2013
METHODS FOR THE EPITAXIAL GROWTH OF SILICON CARBIDE
H Das, S Sunkari, T Oldham, JB Casady
US Patent 20,130,062,628, 2013
10*2013
Selective epitaxial growth of at reduced temperatures using halo-carbon precursor
B Krishnan, H Das, HD Lin, Y Koshka
Applied physics letters 89 (26), 262103, 2006
102006
Evolution of lattice distortions in 4H-SiC wafers with varying doping
NA Mahadik, H Das, S Stoupin, RE Stahlbush, PL Bonanno, X Xu, ...
Scientific Reports 10 (1), 1-9, 2020
92020
Avalanche rugged 1200 V 80 m Ω SiC MOSFETs with state-of-the-art threshold voltage stability
M Domeij, J Franchi, B Buono, K Lee, KS Park, CS Choi, S Sunkari, H Das
2018 IEEE 6th Workshop on Wide Bandgap Power Devices and Applications (WiPDA …, 2018
82018
High Uniformity with Reduced Surface Roughness of Chloride Based CVD Process on 100mm 4° Off-Axis 4H-SiC
H Das, SG Sunkari, T Oldham, JRB Casady, JB Casady
Materials Science Forum 717, 93-96, 2012
82012
Detection of crystal defects in high doped epitaxial layers and substrates by photoluminescence
H Das, S Sunkari, H Naas, M Domeij, A Konstantinov, F Allerstam, ...
Materials Science Forum 897, 222-225, 2017
72017
Classification of Killer and Non-Killer Silicon Carbide Epitaxial Defects and Accurate Prediction of Device Yield
H Das, S Sunkari, H Naas
ECS Meeting Abstracts, 1345, 2017
62017
Classification of Killer and Non-Killer Silicon Carbide Epitaxial Defects and Accurate Prediction of Device Yield
H Das, S Sunkari, H Naas
ECS Transactions 80 (7), 239-243, 2017
62017
The creation of boron deep levels by high-temperature annealing of 4H-silicon carbide
H Das
MISSISSIPPI STATE UNIVERSITY, 2005
52005
The Creation of Boron Deep Levels by High Temperature Annealing of 4H-SiC
H Das
Mississippi State University, 2004
52004
(Invited) Enabling SiC Yield and Reliability through Epitaxy and Characterization
H Das, S Sunkari, M Domeij, A Konstantinov, F Allerstam, T Neyer
ECS Transactions 69 (11), 29-32, 2015
42015
Uniformity and Morphology of 10 x 100mm 4° Off-Axis 4H-SiC Epitaxial Layers and their Effect on Device Performance
H Das, S Sunkari, T Oldham, J Rodgers, J Casady
Materials Science Forum 740, 221-224, 2013
42013
Dislocations and Triangular Defect in Low-temperature Halo-carbon Epitaxial Growth and Selective Epitaxial Growth
H Das, G Melnychuk, Y Koshka
Materials Science Forum 615, 121-124, 2009
32009
Local-loading Effect in Low-temperature Selective Epitaxial Growth of 4H-SiC by Halo-carbon Method
H Das, B Krishnan, G Melnychuk, Y Koshka
Materials Science Forum 600, 163-166, 2009
32009
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