| One-colour control of activation, excitation and deactivation of a fluorescent diarylethene derivative in super-resolution microscopy Y Arai, S Ito, H Fujita, Y Yoneda, T Kaji, S Takei, R Kashihara, M Morimoto, ... Chemical Communications 53 (29), 4066-4069, 2017 | 70 | 2017 |
| Resist underlayer film forming composition containing liquid additive Y Horiguchi, T Shinjo, S Takei US Patent 8,481,247, 2013 | 61 | 2013 |
| Composition for forming gap-filling material for lithography S Takei, KI Mizusawa, Y Sone US Patent 7,517,633, 2009 | 47 | 2009 |
| Silicon-containing spin-on underlayer material for step and flash nanoimprint lithography S Takei, T Ogawa, R Deschner, K Jen, T Nihira, M Hanabata, CG Willson Japanese Journal of Applied Physics 49 (7R), 075201, 2010 | 40 | 2010 |
| Eco-friendly electron beam lithography using water-developable resist material derived from biomass S Takei, A Oshima, T Wakabayashi, T Kozawa, S Tagawa Applied Physics Letters 101 (3), 2012 | 39 | 2012 |
| Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction S Takei, M Hanabata Applied Physics Letters 107 (14), 2015 | 37 | 2015 |
| Reduction of pattern peeling in step-and-flash imprint lithography S Takei, T Ogawa, R Deschner, CG Willson Microelectronic engineering 116, 44-50, 2014 | 33 | 2014 |
| Organic solvent-free water-developable sugar resist material derived from biomass in green lithography S Takei, A Oshima, T Ichikawa, A Sekiguchi, M Kashiwakura, T Kozawa, ... Microelectronic Engineering 122, 70-76, 2014 | 30 | 2014 |
| Electron beam lithography using highly sensitive negative type of plant-based resist material derived from biomass on hardmask layer S Takei, A Oshima, A Sekiguchi, N Yanamori, M Kashiwakura, T Kozawa, ... Applied Physics Express 4 (10), 106502, 2011 | 30 | 2011 |
| Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating S Takei, Y Horiguchi, K Hashimoto, M Nakajima US Patent 8,048,615, 2011 | 29 | 2011 |
| Study of high etch rate bottom antireflective coating and gap fill materials using dextrin derivatives in ArF lithography S Takei, T Shinjo, Y Sakaida Japanese Journal of Applied Physics 46 (11R), 7279, 2007 | 29 | 2007 |
| Study of self cross-link bottom antireflective coating and gap fill materials for sublimate defect reduction in ArF lithography S Takei, T Shinjo, Y Sakaida Japanese journal of applied physics 46 (3R), 949, 2007 | 29 | 2007 |
| Composition for forming nitride coating film for hard mask S Takei, Y Sakaida US Patent 7,727,902, 2010 | 28 | 2010 |
| Step and flash nano imprint lithography of 80 nm dense line pattern using trehalose derivative resist material S Takei Applied physics express 3 (2), 025202, 2010 | 28 | 2010 |
| Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography S Takei, H Maki, K Sugahara, K Ito, M Hanabata AIP Advances 5 (7), 2015 | 26 | 2015 |
| Composition for forming resist underlayer film for nanoimprint S Takei, T Ohashi US Patent App. 13/386,230, 2012 | 26 | 2012 |
| Developer-soluble gap fill materials for patterning metal trenches in via-first dual damascene process M Bhave, K Edwards, CA Washburn, S Takei, Y Sakaida, Y Nakajima Advances in Resist Technology and Processing XXI 5376, 640-647, 2004 | 26 | 2004 |
| Ultraviolet nano imprint lithography using fluorinated silicon-based resist materials S Takei Applied Physics Express 3 (2), 025203, 2010 | 25 | 2010 |
| Gas‐Permeable Cellulose Template for Reduction of Template Damage and Gas Trapping in Microimprint Lithography of High Volume Manufacturing S Takei, S Nakajima, K Sugahara, M Hanabata, Y Matsumoto, ... Macromolecular Materials and Engineering 301 (8), 902-906, 2016 | 24 | 2016 |
| Underlayer coating forming composition for lithography containing compound having protected carboxyl group S Takei, T Kishioka, Y Sakaida, T Shinjo US Patent 7,226,721, 2007 | 23 | 2007 |
Hiroshi MiyasakaOsaka University在 chem.es.osaka-u.ac.jp 的电子邮件经过验证
