| Automated classification of manufacturing process capability utilizing part shape, material, and quality attributes C Zhao, M Dinar, SN Melkote Journal of computing and information science in engineering 20 (2), 021011, 2020 | 19 | 2020 |
| A data-driven framework for learning the capability of manufacturing process sequences C Zhao, M Dinar, SN Melkote Journal of manufacturing systems 64, 68-80, 2022 | 16 | 2022 |
| Learning the manufacturing capabilities of machining and finishing processes using a deep neural network model C Zhao, SN Melkote Journal of Intelligent Manufacturing 35 (4), 1845-1865, 2024 | 6 | 2024 |
| Learning the part shape and part quality generation capabilities of machining and finishing processes using a neural network model C Zhao, SN Melkote International Design Engineering Technical Conferences and Computers and …, 2022 | 4 | 2022 |
| Process modeling and in-situ monitoring of photopolymerization for exposure controlled projection lithography (ECPL) J Wang, C Zhao, Y Zhang, A Jariwala, D Rosen University of Texas at Austin, 2017 | 4 | 2017 |
| Real time monitoring of exposure controlled projection lithography with time-varying scanning points C Zhao, AS Jariwala, DW Rosen University of Texas at Austin, 2016 | 2 | 2016 |
| Deep learning and sequence mining for manufacturing process and sequence selection C Zhao, M Dinar, SN Melkote International Journal of Production Research 62 (14), 5293-5314, 2024 | 1 | 2024 |
| Process-aware part retrieval for cyber manufacturing using unsupervised deep learning X Yan, Z Wang, J Bjorni, C Zhao, M Dinar, D Rosen, S Melkote CIRP annals 72 (1), 397-400, 2023 | 1 | 2023 |
| Experimental implementation and investigation of real-time metrology for exposure controlled projection lithography X Zhao, JM Wang, C Zhao, A Jariwala, DW Rosen University of Texas at Austin, 2016 | 1 | 2016 |
| Data for Process-aware part retrieval for cyber manufacturing using unsupervised deep learning X Yan, Z Wang, J Bjorni, C Zhao, M Dinar, D Rosen, S Melkote Georgia Institute of Technology, 2024 | | 2024 |
| Real-time monitoring of exposure controlled projection lithography (ECPL) process C Zhao Georgia Institute of Technology, 2017 | | 2017 |
| Real Time Monitoring Of Exposure Controlled Projection C Zhao, AS Jariwala, DW Rosen | | 2016 |
Shreyes N. MelkoteGeorgia Institute of Technology在 me.gatech.edu 的电子邮件经过验证
