| Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development G O’Sullivan, B Li, R D’Arcy, P Dunne, P Hayden, D Kilbane, ... Journal of Physics B: Atomic, Molecular and Optical Physics 48 (14), 144025, 2015 | 125 | 2015 |
| Rare-earth plasma extreme ultraviolet sources at 6.5–6.7 nm T Otsuka, D Kilbane, J White, T Higashiguchi, N Yugami, T Yatagai, ... Applied Physics Letters 97 (11), 2010 | 122 | 2010 |
| Feasibility study of broadband efficient “water window” source T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, B Li, P Dunne, ... Applied Physics Letters 100 (1), 2012 | 93 | 2012 |
| Optimizing 13.5 nm laser-produced tin plasma emission as a function of laser wavelength J White, P Dunne, P Hayden, F O’Reilly, G O’sullivan Applied Physics Letters 90 (18), 2007 | 91 | 2007 |
| Simplified modeling of 13.5 nm unresolved transition array emission of a Sn plasma and comparison with experiment J White, P Hayden, P Dunne, A Cummings, N Murphy, P Sheridan, ... Journal of Applied Physics 98 (11), 2005 | 90 | 2005 |
| 13.5 nm extreme ultraviolet emission from tin based laser produced plasma sources P Hayden, A Cummings, N Murphy, G O’Sullivan, P Sheridan, J White, ... Journal of applied physics 99 (9), 2006 | 87 | 2006 |
| Extreme ultraviolet source at 6.7 nm based on a low-density plasma T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, B Li, D Kilbane, ... Applied Physics Letters 99 (19), 2011 | 84 | 2011 |
| The photoabsorption spectrum of an indium laser produced plasma G Duffy, P Dunne Journal of Physics B: Atomic, Molecular and Optical Physics 34 (6), L173, 2001 | 83 | 2001 |
| Systematic investigation of self-absorption and conversion efficiency of 6.7 nm extreme ultraviolet sources T Otsuka, D Kilbane, T Higashiguchi, N Yugami, T Yatagai, W Jiang, ... Applied Physics Letters 97 (23), 2010 | 74 | 2010 |
| 4d→ 5p transitions in the extreme ultraviolet photoabsorption spectra of Sn II and Sn III G Duffy, P van Kampen, P Dunne Journal of Physics B: Atomic, Molecular and Optical Physics 34 (15), 3171, 2001 | 72 | 2001 |
| Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma T Cummins, T Otsuka, N Yugami, W Jiang, A Endo, B Li, C O’Gorman, ... Applied Physics Letters 100 (6), 2012 | 63 | 2012 |
| UTA versus line emission for EUVL: studies on xenon emission at the NIST EBIT K Fahy, P Dunne, L McKinney, G O'Sullivan, E Sokell, J White, A Aguilar, ... Journal of Physics D: Applied Physics 37 (23), 3225, 2004 | 61 | 2004 |
| Quasi-Moseley's law for strong narrow bandwidth soft x-ray sources containing higher charge-state ions H Ohashi, T Higashiguchi, Y Suzuki, G Arai, Y Otani, T Yatagai, B Li, ... Applied Physics Letters 104 (23), 2014 | 59 | 2014 |
| Characteristics of extreme ultraviolet emission from mid-infrared laser-produced rare-earth Gd plasmas T Higashiguchi, B Li, Y Suzuki, M Kawasaki, H Ohashi, S Torii, ... Optics Express 21 (26), 31837-31845, 2013 | 56 | 2013 |
| Opacity of neutral and low ion stages of Sn at the wavelength 13.5 nm used in extreme-ultraviolet lithography M Lysaght, D Kilbane, N Murphy, A Cummings, P Dunne, G O’Sullivan Physical Review A—Atomic, Molecular, and Optical Physics 72 (1), 014502, 2005 | 54 | 2005 |
| Conversion efficiency of a laser-produced Sn plasma at 13.5 nm, simulated with a one-dimensional hydrodynamic model and treated as a multi-component blackbody A Cummings, G O'Sullivan, P Dunne, E Sokell, N Murphy, J White Journal of Physics D: Applied Physics 38 (4), 604, 2005 | 54 | 2005 |
| Variable composition laser-produced Sn plasmas—a study of their time-independent ion distributions A Cummings, G O'sullivan, P Dunne, E Sokell, N Murphy, J White, K Fahy, ... Journal of Physics D: Applied Physics 37 (17), 2376, 2004 | 44* | 2004 |
| Angular emission and self-absorption studies of a tin laser produced plasma extreme ultraviolet source between 10 and 18nm O Morris, F O’Reilly, P Dunne, P Hayden Applied Physics Letters 92 (23), 2008 | 43 | 2008 |
| Prepulse-enhanced narrow bandwidth soft x-ray emission from a low debris, subnanosecond, laser plasma source P Dunne, G O’sullivan, D O’Reilly Applied Physics Letters 76 (1), 34-36, 2000 | 43 | 2000 |
| Gd plasma source modeling at 6.7 nm for future lithography B Li, P Dunne, T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, ... Applied Physics Letters 99 (23), 2011 | 39 | 2011 |
Takeshi HIGASHIGUCHIUtsunomiya University在 cc.utsunomiya-u.ac.jp 的电子邮件经过验证
